A detailed study on the structures of steady-state collisionless kinetic sheath near a dielectric wall with secondary electron emission. I. Classic sheath and its structure transition

2018 ◽  
Vol 25 (6) ◽  
pp. 063519 ◽  
Author(s):  
Shaowei Qing ◽  
Chengyu Wu
Keyword(s):  
Steady State ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Structure Transition ◽  
Dielectric Wall

Stability of different plasma sheaths near a dielectric wall with secondary electron emission

2019 ◽  
Vol 85 (6) ◽  
Author(s):  
Shaowei Qing ◽  
Jianguo Wei ◽  
Wen Chen ◽  
Shengli Tang ◽  
Xiaogang Wang
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Collisionless Plasma ◽  
Secondary Electron Emission ◽  
Plasma Sheath ◽  
Dielectric Wall ◽  
Maxwellian Plasma ◽  
Wide Range ◽  
Plasma Sheaths ◽  
Sheath Structure

The linear theory stability of different collisionless plasma sheath structures, including the classic sheath, inverse sheath and space-charge limited (SCL) sheath, is investigated as a typical eigenvalue problem. The three background plasma sheaths formed between a Maxwellian plasma source and a dielectric wall with a fully self-consistent secondary electron emission condition are solved by recent developed 1D3V (one-dimensional space and three-dimensional velocities), steady-state, collisionless kinetic sheath model, within a wide range of Maxwellian plasma electron temperature $T_{e}$ . Then, the eigenvalue equations of sheath plasma fluctuations through the three sheaths are numerically solved, and the corresponding damping and growth rates $\unicode[STIX]{x1D6FE}$ are found: (i) under the classic sheath structure (i.e. $T_{e}<T_{ec}$ (the first threshold)), there are three damping solutions (i.e. $\unicode[STIX]{x1D6FE}_{1}$ , $\unicode[STIX]{x1D6FE}_{2}$ and $\unicode[STIX]{x1D6FE}_{3}$ , $0>\unicode[STIX]{x1D6FE}_{1}>\unicode[STIX]{x1D6FE}_{2}>\unicode[STIX]{x1D6FE}_{3}$ ) for most cases, but there is only one growth-rate solution $\unicode[STIX]{x1D6FE}$ when $T_{e}\rightarrow T_{ec}$ due to the inhomogeneity of sheath being very weak; (ii) under the inverse sheath structure, which arises when $T_{e}>T_{ec}$ , there are no background ions in the sheath so that the fluctuations are stable; (iii) under the SCL sheath conditions (i.e. $T_{e}\geqslant T_{e\text{SCL}}$ , the second threshold), the obvious ion streaming through the sheath region again emerges and the three damping solutions are again found.

On characteristics of sheath damping near a dielectric wall with secondary electron emission

2011 ◽  
Vol 20 (6) ◽  
pp. 065204 ◽  
Author(s):  
Da-Ren Yu ◽  
Shao-Wei Qing ◽  
Guo-Jun Yan ◽  
Ping Duan
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Dielectric Wall

Sheath structure transition controlled by secondary electron emission

2015 ◽  
Vol 24 (2) ◽  
pp. 025012 ◽  
Author(s):  
I V Schweigert ◽  
S J Langendorf ◽  
M L R Walker ◽  
M Keidar
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Structure Transition ◽  
Sheath Structure

Secondary electron emission from a nickel surface produced by positive ions of mercury

1932 ◽  
Vol 28 (3) ◽  
pp. 349-355 ◽  
Author(s):  
Rafi Mahommed Chaudhri
Keyword(s):  
Steady State ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Mercury Vapour ◽  
Nickel Surface ◽  
Positive Ions ◽  
Ion Energies ◽  
Final Steady State ◽  
The Impact

(1)A beam of positive ions of mercury produced from an arc in mercury vapour and fired upon a surface of nickel produces an emission of electrons.(2)For a fresh untreated nickel target the electron emission is of the order of 1·5 per cent. for ion energies less than about 600 electron-volts, and rises to about 15–20 per cent. at 2000 electron-volts.(3)After degassing thoroughly at a red heat the secondary electron emission is found to fall to about half the value observed with a dirty target. Continued bombardment with mercury ions leads to a progressive decrease in the emission, which approaches a final steady state after some hours. In this steady state the ratio is about 2·3 per cent. at 2000 electron-volts. After degassing afresh, the same process is repeated.(4)Tests were made to assure that the emission is in reality one of electrons from the struck target, and that it is due to the impact of the positive ions.

Historical Introduction

1977 ◽  
Vol 35 ◽  
pp. 2-5
Author(s):  
R. D. Heidenreich
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
50Th Anniversary ◽  
Secondary Emission ◽  
Wave Nature ◽  
Nobel Prize In Physics ◽  
Primary Electrons ◽  
The U.S ◽  
Mutual Agreement

This program has been organized by the EMSA to commensurate the 50th anniversary of the experimental verification of the wave nature of the electron. Davisson and Germer in the U.S. and Thomson and Reid in Britian accomplished this at about the same time. Their findings were published in Nature in 1927 by mutual agreement since their independent efforts had led to the same conclusion at about the same time. In 1937 Davisson and Thomson shared the Nobel Prize in physics for demonstrating the wave nature of the electron deduced in 1924 by Louis de Broglie.The Davisson experiments (1921-1927) were concerned with the angular distribution of secondary electron emission from nickel surfaces produced by 150 volt primary electrons. The motivation was the effect of secondary emission on the characteristics of vacuum tubes but significant deviations from the results expected for a corpuscular electron led to a diffraction interpretation suggested by Elasser in 1925.

SEM and Auger microanalysis studies of Cu-Be dynode surfaces at each activation condition

1978 ◽  
Vol 36 (1) ◽  
pp. 524-525
Author(s):  
T. Koshikawa ◽  
Y. Fujii ◽  
E. Sugata ◽  
F. Kanematsu
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Life Time ◽  
Activation Process ◽  
Beam Diameter ◽  
Activation Temperature ◽  
Electron Multiplier ◽  
Activation Condition ◽  
Activation Conditions

The Cu-Be alloys are widely used as the electron multiplier dynodes after the adequate activation process. But the structures and compositions of the elements on the activated surfaces were not studied clearly. The Cu-Be alloys are heated in the oxygen atmosphere in the usual activation techniques. The activation conditions, e.g. temperature and O2 pressure, affect strongly the secondary electron yield and life time of dynodes.In the present paper, the activated Cu-Be dynode surfaces at each condition are investigated with Scanning Auger Microanalyzer (SAM) (primary beam diameter: 3μmϕ) and SEM. The commercial Cu-Be(2%) alloys were polished with Cr2O3 powder, rinsed in the distilled water and set in the vacuum furnance.Two typical activation condition, i.e. activation temperature 730°C and 810°C in 5x10-3 Torr O2 pressure were chosen since the formation mechanism of the BeO film on the Cu-Be alloys was guessed to be very different at each temperature from the results of the secondary electron emission measurements.

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

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