scholarly journals The influence of alloying on the phase formation sequence of ultra-thin nickel silicide films and on the inheritance of texture

2018 ◽  
Vol 123 (18) ◽  
pp. 185302 ◽  
Author(s):  
F. A. Geenen ◽  
E. Solano ◽  
J. Jordan-Sweet ◽  
C. Lavoie ◽  
C. Mocuta ◽  
...  
Keyword(s):  
Phase Formation ◽  
Nickel Silicide ◽  
Thin Nickel

Growth of Thin Nickel Silicide Layers on Clean B-Doped Si(111) Surfaces at Room Temperature

1989 ◽  
Vol 160 ◽  
Author(s):  
L. Luo ◽  
G. A. Smith ◽  
W. M. Gibson
Keyword(s):  
Monte Carlo ◽  
Computer Simulations ◽  
Room Temperature ◽  
High Energy ◽  
Nickel Silicide ◽  
Growth Stages ◽  
Initial Growth ◽  
Fourth Layer ◽  
Ion Channeling ◽  
Thin Nickel

AbstractThe initial growth stages of Ni on clean B-doped Si(111) were studied at room temperature using high energy Ion channeling and Monte Carlo computer simulations of the Ni/Si interface. The results suggest that the first monolayer of Ni atoms diffuse to reaction sites in the fourth layer of the Si(111) substrate where nickel suicide growth begins. Further Ni deposition (up to ~ 3 ML) leads to the growth of NiSi2 which is thought to be a diffusion barrier that terminates further formation of NiSi2 at room temperature.

In situ real-time studies of nickel silicide phase formation

2001 ◽  
Vol 19 (2) ◽  
pp. 376 ◽  
Author(s):  
M. Tinani ◽  
A. Mueller ◽  
Y. Gao ◽  
E. A. Irene ◽  
Y. Z. Hu ◽  
...  
Keyword(s):  
Real Time ◽  
Phase Formation ◽  
Nickel Silicide ◽  
Silicide Phase

Size Effects on Phase Formation and Electrical Robustness of Nickel Silicide Nanowires

2013 ◽  
Author(s):  
I.H. Chen ◽  
Y.Y. Hsiao ◽  
C.C. Wang ◽  
C.L. Hsin ◽  
P.W. Li
Keyword(s):  
Phase Formation ◽  
Size Effects ◽  
Nickel Silicide

Phase Formation and Morphology of Nickel Silicide Thin Films Synthesized by Catalyzed Chemical Vapor Reaction of Nickel with Silane

2014 ◽  
Vol 27 (1) ◽  
pp. 245-254 ◽  
Author(s):  
Antony Premkumar Peter ◽  
Johan Meersschaut ◽  
Olivier Richard ◽  
Alain Moussa ◽  
Johnny Steenbergen ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Formation ◽  
Chemical Vapor ◽  
Nickel Silicide

Time-resolved study of thin nickel silicide layer growth at the nickel film-Si(100) interface

1988 ◽  
Vol 164 ◽  
pp. 481-486 ◽  
Author(s):  
P.K. John ◽  
H. Frolich ◽  
A.C. Rastogi ◽  
B.Y. Tong
Keyword(s):  
Layer Growth ◽  
Nickel Silicide ◽  
Nickel Film ◽  
Time Resolved ◽  
Silicide Layer ◽  
Thin Nickel

scholarly journals Phase formation and texture of thin nickel germanides on Ge(001) and Ge(111)

2016 ◽  
Vol 119 (13) ◽  
pp. 135305 ◽  
Author(s):  
B. De Schutter ◽  
K. Van Stiphout ◽  
N. M. Santos ◽  
E. Bladt ◽  
J. Jordan-Sweet ◽  
...  
Keyword(s):  
Phase Formation ◽  
Thin Nickel ◽  
Nickel Germanides

scholarly journals Physical and electrical properties of ultra-thin nickel silicide Schottky diodes on Si (100)

2013 ◽  
Vol 417 ◽  
pp. 012015 ◽  
Author(s):  
Y Tamura ◽  
R Yoshihara ◽  
K Kakushima ◽  
H Nohira ◽  
O Nakatsuka ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Schottky Diodes ◽  
Nickel Silicide ◽  
Thin Nickel
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