Study of plasma parameters in a pulsed plasma accelerator using triple Langmuir probe

2018 ◽  
Vol 25 (1) ◽  
pp. 013532 ◽  
Author(s):  
S. Borthakur ◽  
N. Talukdar ◽  
N. K. Neog ◽  
T. K. Borthakur
Keyword(s):  
Langmuir Probe ◽  
Plasma Accelerator ◽  
Pulsed Plasma ◽  
Plasma Parameters

Measurement of plasma parameters of a quasistationary plasma accelerator from self-absorbed spectral lines

1992 ◽  
Vol 56 (3) ◽  
pp. 281-286
Author(s):  
Ya. F. Volkov ◽  
V. V. Marinin ◽  
N. I. Mitina ◽  
M. A. Tiarov ◽  
S. A. Trubchaninov
Keyword(s):  
Plasma Accelerator ◽  
Spectral Lines ◽  
Plasma Parameters

Study of pulsed plasma doping by Langmuir probe and ion mass-energy analyzer

2002 ◽  
Author(s):  
Ziwei Fang Ziwei Fang ◽  
Bon-Woong Koo Bon-Woong Koo ◽  
S. Felch ◽  
Yu Lei Yu Lei ◽  
L.J. Overzet ◽  
...  
Keyword(s):  
Langmuir Probe ◽  
Pulsed Plasma ◽  
Energy Analyzer ◽  
Mass Energy ◽  
Plasma Doping

A PULSED PLASMA ACCELERATOR EMPLOYING ELECTRODES

1960 ◽  
pp. 183-201
Author(s):  
S. Georgiev ◽  
R. Feinberg ◽  
G.S. Janes
Keyword(s):  
Plasma Accelerator ◽  
Pulsed Plasma

Spectroscopic Study and Amorphous Film Deposition in RF and Pulsed Plasma Processings

1988 ◽  
Vol 117 ◽  
Author(s):  
Kenji Ebihara ◽  
Seiji Kanazawa ◽  
Sadao Maeda
Keyword(s):  
Processing System ◽  
Optical Emission ◽  
Quantitative Relationship ◽  
Amorphous Film ◽  
Film Deposition ◽  
Rf Discharge ◽  
Pulsed Plasma ◽  
Plasma Parameters ◽  
Optical Emission Spectrum ◽  
Plasma State

AbstractProcessing plasmas generated by three types of discharges are diagnosed spectroscopically in order to estimate the quantitative relationship between plasma parameters and electrical and optical properties of deposited materials. An rf discharge is capacitively produced by a 13.56 MHz rf oscillator. A microwave generator operating at 2.45 GHz is used to supply power to a discharge cavity. Further a pulsed plasma which is inductively generated by pulsed current ( 70 kA peak ) is applied to study dissociation process in the transient plasma and possibility of a novel processing system. The gases used are methane for amorphous carbon formation and silane for amorphous silicon deposition. Measurements of optical emission spectrum are performed to estimate the processing plasma state by the relative spectral intensity method and the Doppler-broadening method.

Surface effects in a pulsed plasma accelerator

AIAA Journal ◽  
1964 ◽  
Vol 2 (7) ◽  
pp. 1342-1343 ◽  
Author(s):  
WILLIAM J. GUMAN ◽  
WILLIAM TRUGLIO
Keyword(s):  
Surface Effects ◽  
Plasma Accelerator ◽  
Pulsed Plasma
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