The discharge characteristics in nitrogen helicon plasma

2017 ◽  
Vol 24 (12) ◽  
pp. 123507 ◽  
Author(s):  
Gao Zhao ◽  
Huihui Wang ◽  
Xinlu Si ◽  
Jiting Ouyang ◽  
Qiang Chen ◽  
...  
2017 ◽  
Vol 57 (9) ◽  
pp. 377-386
Author(s):  
Guang-Qing Xia ◽  
Qiu-Yun Wu ◽  
Liu-Wei Chen ◽  
Shi-Yuan Cong ◽  
Ya-Jie Han

2017 ◽  
Vol 137 (9) ◽  
pp. 536-541
Author(s):  
Tomohiro Kawashima ◽  
Tomohiro Yamada ◽  
Yoshinobu Murakami ◽  
Masayuki Nagao ◽  
Sou Ozaki ◽  
...  

2012 ◽  
Vol 132 (4) ◽  
pp. 284-290 ◽  
Author(s):  
Masakazu Higashiyama ◽  
Hajime Takada ◽  
Masayuki Hayashi ◽  
Masahiro Kozako ◽  
Masayuki Hikita ◽  
...  

2017 ◽  
Vol 137 (4) ◽  
pp. 188-195
Author(s):  
Takao Akahoshi ◽  
Kyunghoon Jang ◽  
Masahiro Kozako ◽  
Masayuki Hikita ◽  
Soichiro Kainaga ◽  
...  

2003 ◽  
Vol 772 ◽  
Author(s):  
Masakazu Muroyama ◽  
Kazuto Kimura ◽  
Takao Yagi ◽  
Ichiro Saito

AbstractA carbon nanotube triode using Helicon Plasma-enhanced CVD with electroplated NiCo catalyst has been successfully fabricated. Isolated NiCo based metal catalyst was deposited at the bottom of the cathode wells by electroplating methods to control the density of carbon nanotubes and also reduce the activation energy of its growth. Helicon Plasma-enhanced CVD (HPECVD) has been used to deposit nanotubes at 400°C. Vertically aligned carbon nanotubes were then grown selectively on the electroplated Ni catalyst. Field emission measurements were performed with a triode structure. At a cathode to anode gap of 1.1mm, the turn on voltage for the gate was 170V.


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