Disorder induced gap states as a cause of threshold voltage instabilities in Al2O3/AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors

2017 ◽  
Vol 122 (22) ◽  
pp. 224504 ◽  
Author(s):  
M. Matys ◽  
S. Kaneki ◽  
K. Nishiguchi ◽  
B. Adamowicz ◽  
T. Hashizume
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