Electrostatic simulation of a complete cluster deposition apparatus

B. Elger; T. Schmidt; S. Krähling; F. Neuberger; R. Schäfer

doi:10.1063/1.4984968

Electrostatic simulation of a complete cluster deposition apparatus

Review of Scientific Instruments ◽

10.1063/1.4984968 ◽

2017 ◽

Vol 88 (6) ◽

pp. 063303 ◽

Cited By ~ 1

Author(s):

B. Elger ◽

T. Schmidt ◽

S. Krähling ◽

F. Neuberger ◽

R. Schäfer

Keyword(s):

Cluster Deposition

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An original way to elaborate cermet thin films: cluster deposition

Journal de Physique I ◽

10.1051/jp1:1994178 ◽

1994 ◽

Vol 4 (7) ◽

pp. 991-995 ◽

Cited By ~ 4

Author(s):

J. F. Roux ◽

M. Treilleux ◽

B. Cabaud ◽

G. Fuchs ◽

C. Montandon ◽

...

Keyword(s):

Thin Films ◽

Cluster Deposition

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Contact epitaxy in multiple cluster deposition

Applied Physics Letters ◽

10.1063/1.2410220 ◽

2006 ◽

Vol 89 (25) ◽

pp. 253109 ◽

Cited By ~ 10

Author(s):

K. Meinander ◽

T. T. Järvi ◽

K. Nordlund

Keyword(s):

Cluster Deposition ◽

Multiple Cluster

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Growth of high-quality ITO thin films at low temperature by tuning the oxygen flow rate using the nano-cluster deposition (NCD) technique

Chemical Physics Letters ◽

10.1016/j.cplett.2010.03.035 ◽

2010 ◽

Vol 490 (4-6) ◽

pp. 234-237 ◽

Cited By ~ 14

Author(s):

S.V.N. Pammi ◽

Anupama Chanda ◽

Nak-Jin Seong ◽

Soon-Gil Yoon

Keyword(s):

Thin Films ◽

Low Temperature ◽

Flow Rate ◽

Oxygen Flow Rate ◽

Oxygen Flow ◽

High Quality ◽

Cluster Deposition ◽

Ito Thin Films ◽

Nano Cluster

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The effects of Fe substrate orientations on Cu55 cluster deposition with different incident energies

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2021.03.015 ◽

2021 ◽

Vol 496 ◽

pp. 52-60

Author(s):

Yiwen He ◽

Shixu Zhang ◽

Luanxuan He ◽

Xuejian Wang ◽

Zhijun Zheng ◽

...

Keyword(s):

Cluster Deposition

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Velocity dependence of metal cluster deposition on an insulating surface

The European Physical Journal D ◽

10.1140/epjd/e2004-00067-5 ◽

2004 ◽

Vol 30 (1) ◽

pp. 65-70 ◽

Cited By ~ 5

Author(s):

A. Ipatov ◽

P.-G. Reinhard ◽

E. Suraud

Keyword(s):

Metal Cluster ◽

Velocity Dependence ◽

Cluster Deposition

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Ag and Co cluster deposition on GaAs(110): Fermi level pinning in the absence of metal-induced gap states and defects

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584586 ◽

1989 ◽

Vol 7 (4) ◽

pp. 950 ◽

Cited By ~ 29

Author(s):

G. D. Waddill

Keyword(s):

Fermi Level ◽

Fermi Level Pinning ◽

Cluster Deposition ◽

Gap States

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Preparation of Magnetically Soft, Highly-Densified Fe Cluster-Assembled Films by Impact Cluster Deposition

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.11-12.595 ◽

2006 ◽

Vol 11-12 ◽

pp. 595-598

Author(s):

Dong Liang Peng ◽

K. Sumiyama ◽

H. Yamada ◽

Takehiko Hihara ◽

T. Uchida

Keyword(s):

Room Temperature ◽

Magnetic Behavior ◽

Cluster Beam ◽

Frequency Range ◽

Soft Magnetic ◽

Size Change ◽

Gas Condensation ◽

Cluster Deposition ◽

The Impact ◽

High Cluster

Highly-densified Fe cluster-assembled films were obtained at room temperature by an energetic cluster deposition. Fe clusters were produced using a plasma-gas-condensation (PGC)-type cluster deposition apparatus with a high cluster productivity. Ionized clusters in a cluster beam were electrically accelerated and directly deposited onto a substrate together with neutral clusters from the same cluster source. By increasing the impact energy of the ionized clusters up to about 1 eV/atom, the obtained cluster-assemblies have packing fractions higher than 0.8 without any serious size change, and result in a soft magnetic behavior up to a frequency range of few hundred MHz.

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