Effect of annealing on pulse laser deposition grown copper oxide thin film

2017 ◽  
Author(s):  
Vaibhavi H. Mistry ◽  
Bhaumik V. Mistry ◽  
B. P. Modi ◽  
U. S. Joshi
Keyword(s):  
Thin Film ◽  
Copper Oxide ◽  
Pulse Laser Deposition ◽  
Pulse Laser ◽  
Laser Deposition ◽  
Oxide Thin Film ◽  
Copper Oxide Thin Film

Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication

2015 ◽  
Vol 73 (1) ◽  
Author(s):  
Jia Wei Low ◽  
Nafarizal Nayan ◽  
Mohd Zainizan Sahdan ◽  
Mohd Khairul Ahmad ◽  
Ali Yeon Md Shakaff ◽  
...  
Keyword(s):  
Thin Film ◽  
Copper Oxide ◽  
Flow Rate ◽  
Langmuir Probe ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Oxide Thin Film ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Copper Oxide Thin Film

Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using optical emission spectroscopy and Langmuir probe. The intensity of the light emission from atoms and radicals in the plasma were measured using optical emission spectroscopy (OES). Then, Langmuir probe was employed to estimate the plasma density, electron temperature and ion flux. In present studies, reactive copper sputtering plasmas were produced at different oxygen flow rate of 0, 4, 8 and 16 sccm. The size of copper target was 3 inches. The dissipation rf power, Ar flow rate and working pressure were fixed at 400 W, 50 sccm and 22.5 mTorr, respectively. Since the substrate bias plays an important role to the thin film formation, the substrate bias voltages of 0, -40, -60 and -100 V were studied. Based on OES results, oxygen emission increased drastically when the oxygen flow rate above 8 sccm. On the other hand, copper and argon emission decreased gradually. In addition, Langmuir probe results showed a different ion flux when substrate bias voltage was applied. Based on these plasma diagnostic results, it has been concluded that the optimized parameter to produce copper oxide thin film are between -40 to -60 V of substrate bias voltage and between 8 to 12 sccm of oxygen flow rate.

In situ X-ray Studies of (La,Sr)MnO3_δ, (La,Sr)CoO3_δ, and La0.6Sr0.4Co0.2Fe0.8O3-δ Thin Film SOFC Cathodes Grown by Pulse Laser Deposition

2013 ◽  
Vol 1495 ◽  
Author(s):  
Kee-Chul Chang ◽  
Brian Ingram ◽  
Paul Salvador ◽  
Bilge Yildiz ◽  
Hoydoo You
Keyword(s):  
Thin Film ◽  
Solid Oxide Fuel Cells ◽  
Pulse Laser Deposition ◽  
Pulse Laser ◽  
Solid Oxide ◽  
Laser Deposition ◽  
Pulse Laser Deposition Technique ◽  
Oxide Fuel ◽  
X Ray

ABSTRACTWe will briefly review in situ synchrotron x-ray investigation of model thin film cathode systems for solid oxide fuel cells. The film cathodes examined in this study are (La,Sr)MnO3_δ (LSM), (La,Sr)CoO3_δ (LSC), and La0.6Sr0.4Co0.2Fe0.8O3-δ (LSCF) thin films epitaxially grown on YSZ single crystal substrates by the pulse laser deposition technique. We find in all cases that Sr is enriched or segregated to the surface of the film cathodes. We concluded that the Sr enrichments or segregations are mainly the results of annealing because they do not depend on whether the cathodes are electrochemically biased or not during annealing. However, at least in the case of LSCF, we find that B-site Co segregates rather uniformly to the surface and the segregation responds sensitively and reversibly to the electrochemical bias.

Facile preparation of reduced graphene oxide wrapped copper oxide thin film solar selective absorbers

2020 ◽  
Vol 46 (17) ◽  
pp. 27897-27902 ◽  
Author(s):  
N. Murugesan ◽  
S. Suresh ◽  
M. Kandasamy ◽  
S. Murugesan ◽  
S. Karthick Kumar
Keyword(s):  
Thin Film ◽  
Graphene Oxide ◽  
Copper Oxide ◽  
Reduced Graphene Oxide ◽  
Oxide Thin Film ◽  
Reduced Graphene ◽  
Facile Preparation ◽  
Copper Oxide Thin Film

Characterization of Cu2ZnSnS4 thin film deposited by pulse laser deposition

2017 ◽  
Author(s):  
Sergiu Macavei ◽  
Dana Toloman ◽  
Maria Stefan ◽  
Adriana Popa ◽  
Lucian Barbu-Tudoran ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulse Laser Deposition ◽  
Pulse Laser ◽  
Laser Deposition ◽  
Cu2znsns4 Thin Film

Vacuum ultraviolet photoconductive detector based on pulse laser deposition-grown neodymium fluoride thin film

2013 ◽  
Vol 534 ◽  
pp. 12-14 ◽  
Author(s):  
Tatsuya Ishimaru ◽  
Mirai Ieda ◽  
Shingo Ono ◽  
Yuui Yokota ◽  
Takayuki Yanagida ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulse Laser Deposition ◽  
Pulse Laser ◽  
Vacuum Ultraviolet ◽  
Laser Deposition ◽  
Photoconductive Detector

Effect of annealing treatment on sputtered copper oxide thin film

2018 ◽  
Vol 5 (7) ◽  
pp. 15170-15173
Author(s):  
N. Sangwaranatee ◽  
M. Horprathum ◽  
C. Chananonnawathorn ◽  
Hendro
Keyword(s):  
Thin Film ◽  
Copper Oxide ◽  
Annealing Treatment ◽  
Oxide Thin Film ◽  
Copper Oxide Thin Film
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