scholarly journals Molecular dynamic simulation study of plasma etching L10 FePt media in embedded mask patterning (EMP) process

AIP Advances ◽  
2017 ◽  
Vol 7 (5) ◽  
pp. 056507
Author(s):  
Jianxin Zhu ◽  
P. Quarterman ◽  
Jian-Ping Wang
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