Roll-to-roll hot embossing system with shape preserving mechanism for the large-area fabrication of microstructures

2016 ◽  
Vol 87 (10) ◽  
pp. 105120 ◽  
Author(s):  
Linfa Peng ◽  
Hao Wu ◽  
Yunyi Shu ◽  
Peiyun Yi ◽  
Yujun Deng ◽  
...  
Keyword(s):  
Hot Embossing ◽  
Large Area ◽  
Shape Preserving ◽  
Roll To Roll

FABRICATION OF POLYMER MASTER FOR ANTIREFLECTIVE SURFACE USING HOT EMBOSSING AND AAO PROCESS

2008 ◽  
Vol 22 (31n32) ◽  
pp. 5887-5894 ◽  
Author(s):  
HONG GUE SHIN ◽  
JONG TAE KWON ◽  
YOUNG HO SEO ◽  
BYEONG HEE KIM
Keyword(s):  
Aspect Ratio ◽  
Silicon Layer ◽  
Processing Parameters ◽  
Hot Embossing ◽  
Large Area ◽  
Anodized Aluminum ◽  
Simple Method ◽  
Anodized Aluminum Oxide ◽  
Coating Method ◽  
Automobile Components

A simple method for the fabrication of polymer master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index have usually been used. However, it is required to have a high cost and a long processing time for mass production. In this paper, antireflective surface was fabricated by using hot embossing process with porous anodized aluminum oxide. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Size and aspect ratio of nano patterned master are about 175 ± 25 nm and 2 ~ 3, respectively. In order to replicate nano patterned master, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master. Optical and rheological characteristics of antireflective surface were analyzed by using SEM, EDX and spectrometer inspection. Antireflective structure by replicating hot embossing process can be applied to various displays and automobile components.

An Investigation onto Polydimethylsiloxane (PDMS) Printing Plate of Multiple Functional Solid Line by Flexographic

2013 ◽  
Vol 844 ◽  
pp. 158-161 ◽  
Author(s):  
M.I. Maksud ◽  
Mohd Sallehuddin Yusof ◽  
M. Mahadi Abdul Jamil
Keyword(s):  
Laser Ablation ◽  
Line Width ◽  
High Speed ◽  
Printed Electronics ◽  
Low Cost ◽  
Flexible Substrates ◽  
Large Area ◽  
Printing Plate ◽  
Roll To Roll ◽  
Printing Processes

Recently low cost production is vital to produce printed electronics by roll to roll manufacturing printing process like a flexographic. Flexographic has a high speed technique which commonly used for printing onto large area flexible substrates. However, the minimum feature sizes achieved with roll to roll printing processes, such as flexographic is in the range of fifty microns. The main contribution of this limitation is photopolymer flexographic plate unable to be produced finer micron range due to film that made by Laser Ablation Mask (LAMs) technology not sufficiently robust and consequently at micron ranges line will not be formed on the printing plate. Hence, polydimethylsiloxane (PDMS) is used instead of photopolymer. Printing trial had been conducted and multiple solid lines successfully printed for below fifty microns line width with no interference between two adjacent lines of the printed images.

scholarly journals Toward High‐Throughput Texturing of Polymer Foils for Enhanced Light Trapping in Flexible Perovskite Solar Cells Using Roll‐to‐Roll Hot Embossing

2020 ◽  
Vol 22 (4) ◽  
pp. 1901217 ◽  
Author(s):  
Marcos Soldera ◽  
Qiong Wang ◽  
Flavio Soldera ◽  
Valentin Lang ◽  
Antonio Abate ◽  
...  
Keyword(s):  
Solar Cells ◽  
High Throughput ◽  
Light Trapping ◽  
Perovskite Solar Cells ◽  
Hot Embossing ◽  
Roll To Roll ◽  
Polymer Foils

scholarly journals Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

2021 ◽  
Vol 11 (20) ◽  
pp. 9571
Author(s):  
Ga Eul Kim ◽  
Hyuntae Kim ◽  
Kyoohee Woo ◽  
Yousung Kang ◽  
Seung-Hyun Lee ◽  
...  
Keyword(s):  
Contact Pressure ◽  
Nanoimprint Lithography ◽  
Applied Pressure ◽  
Machine Learning Techniques ◽  
Conventional System ◽  
Large Area ◽  
High Productivity ◽  
Roll To Roll ◽  
Learning Techniques ◽  
Roller Machine

We aimed to increase the processing area of the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, using a long roller. It is common for a long roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact pressure between the rollers, which leads to defects such as non-uniform patterning. The non-uniformity of the contact pressure of the conventional R2R NIL system was investigated through finite element (FE) analysis and experiments in the conventional system. To solve the problem, a new large-area R2R NIL uniform pressing system with five multi-backup rollers was proposed and manufactured instead of the conventional system. As a preliminary experiment, the possibility of uniform contact pressure was confirmed by using only the pressure at both ends and one backup roller in the center. A more even contact pressure was achieved by using all five backup rollers and applying an appropriate pushing force to each backup roller. Machine learning techniques were applied to find the optimal combination of the pushing forces. In the conventional pressing process, it was confirmed that pressure deviation of the contact area occurred at a level of 44%; when the improved system was applied, pressure deviation dropped to 5%.

scholarly journals Effects of Preheating and Cooling Durations on Roll-to-Roll Hot Embossing–ERRATUM

2015 ◽  
Vol 21 (1) ◽  
pp. 276-276 ◽  
Author(s):  
Seyoung Kim ◽  
Youngsu Son ◽  
Heechang Park ◽  
Byungin Kim ◽  
Dongwon Yun
Keyword(s):  
Hot Embossing ◽  
Roll To Roll
Sign in / Sign up

Export Citation Format

Share Document