Role of the inversion layer on the charge injection in silicon nanocrystal multilayered light emitting devices

2016 ◽  
Vol 120 (9) ◽  
pp. 093108 ◽  
Author(s):  
S. Tondini ◽  
G. Pucker ◽  
L. Pavesi
2007 ◽  
Vol 253 (18) ◽  
pp. 7506-7509 ◽  
Author(s):  
J.P. Liu ◽  
S.C. Qu ◽  
X.B. Zeng ◽  
Y. Xu ◽  
X.F. Gou ◽  
...  

2020 ◽  
Vol 116 (6) ◽  
pp. 063302
Author(s):  
Robert Newcomb ◽  
John S. Bangsund ◽  
Kyle W. Hershey ◽  
Dominea C. K. Rathwell ◽  
Hong-Yeop Na ◽  
...  

1995 ◽  
Vol 392 ◽  
Author(s):  
T Taskin ◽  
Q Huda ◽  
A Scholes ◽  
J H Evans ◽  
A R Peaker ◽  
...  

AbstractThis paper reports a study of the non-radiative processes competing with the excitation of the erbium ion in layers implanted with high concentrations of erbium and oxygen. These processes reduce the luminescence efficiency of the Si:Er system and dramatically increase the threshold current density calculated to be necessary for an ultimate goal, the Si/Ge:Er LASER. Using cross sectional TEM, photoluminescence as a function of temperature and DLTS, it is demonstrated that a two stage anneal procedure which avoids the formation of extended defects and removes specific deep states is necessary to obtain efficient Er3+ excitation at high erbium concentrations. Comparisons are made with damage resulting from germanium implantation into silicon. The role of multiple stage anneals is discussed in relation to the removal of Shockley-Hall-Read recombination centres


Nano Letters ◽  
2010 ◽  
Vol 10 (4) ◽  
pp. 1154-1157 ◽  
Author(s):  
Kai-Yuan Cheng ◽  
Rebecca Anthony ◽  
Uwe R. Kortshagen ◽  
Russell J. Holmes

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