scholarly journals Verification of antiferromagnetic exchange coupling at room temperature using polar magneto-optic Kerr effect in thin EuS/Co multilayers with perpendicular magnetic anisotropy

2016 ◽  
Vol 109 (6) ◽  
pp. 062401 ◽  
Author(s):  
A. Goschew ◽  
M. Scott ◽  
P. Fumagalli
1997 ◽  
Vol 475 ◽  
Author(s):  
J.T. Kohlhepp ◽  
J.J. De Vries ◽  
F.J.A. Den Broeder ◽  
R. Coehoorn ◽  
R.M. Jungblut ◽  
...  

ABSTRACTThe magnetic interlayer exchange coupling in Fe/Si-based thin film structures employing sputtered multilayers with variations of Si-alloyed Fe for the magnetic layers and Fe-alloyed Si spacers, as well as wedge-shaped MBE-grown Fe/Si/Fe sandwich samples has been systematically studied. From structural and magnetic analysis it is concluded that ultrathin Si and FexSi100-x (x < 50) spacer layers transform into a crystalline iron suicide with a composition close to Fe50Si50. The exchange coupling mediated by this metallic suicide is antiferromagnetic and depends on the spacer thickness in an exponential, i.e. non-oscillatory, manner with a universial characteristic decay length of 3–4 Å at room temperature. This observation can be qualitatively explained within the framework of a recent coupling theory on the premise that the FeSi interlayer has the metastable CsCl(B2)-structure.


AIP Advances ◽  
2020 ◽  
Vol 10 (10) ◽  
pp. 105010
Author(s):  
Ye Du ◽  
Shoma Arai ◽  
Shingo Kaneta-Takada ◽  
Le Duc Anh ◽  
Shutaro Karube ◽  
...  

1994 ◽  
Vol 356 ◽  
Author(s):  
H. E. Inglefield ◽  
G. Bochi ◽  
C. A. Ballentine ◽  
R. C. O’Handley ◽  
C. V. Thompson

AbstractEpitaxial misfit has been characterized in Ni/Cu/Si (100) as a function of Ni film thickness using wafer curvature measurements. This strain can be related to measurements of magnetic anisotropy made in the deposition system using the magneto-optic Kerr effect. Films were deposited using molecular beam epitaxy (MBE) with varying Ni epilayer thickness between 10 and 1000Å. The change in wafer curvature due to misfit strain was measured using optical interferometry and the strain was calculated using Stoney’s equation. Transmission electron microscopy was used to characterize misfit dislocations at the Ni/Cu interface. It has been determined that misfit strain can have a very strong effect on magnetic anisotropy, particularly in the regime between the critical thickness and complete misfit accommodation, where strain has been found to decrease significantly as a function of film thickness. A critical strain has been determined at which a transition in the direction of magnetization easy axis from perpendicular to the film to in the film plane occurs. This discovery allows the use of Kerr effect measurements to characterize misfit strain in situ.


1994 ◽  
Vol 76 (10) ◽  
pp. 6293-6293 ◽  
Author(s):  
J. Tappert ◽  
J. Jungermann ◽  
B. Scholz ◽  
R. A. Brand ◽  
W. Keune

Sign in / Sign up

Export Citation Format

Share Document