scholarly journals Oxide or carbide nanoparticles synthesized by laser ablation of a bulk Hf target in liquids and their structural, optical, and dielectric properties

2016 ◽  
Vol 119 (20) ◽  
pp. 204903 ◽  
Author(s):  
N. G. Semaltianos ◽  
J.-M. Friedt ◽  
R. Chassagnon ◽  
V. Moutarlier ◽  
V. Blondeau-Patissier ◽  
...  
Keyword(s):  
Dielectric Properties ◽  
Laser Ablation

Ultra-thin glasses for semiconductor packaging

2016 ◽  
Vol 2016 (1) ◽  
pp. 000293-000298
Author(s):  
Ruediger Sprengard ◽  
Matthias Jotz ◽  
Martin Letz ◽  
Lutz Parthier ◽  
Fredrik Prince ◽  
...  
Keyword(s):  
Dielectric Properties ◽  
Laser Ablation ◽  
Semiconductor Manufacturing ◽  
Mechanical Stability ◽  
Manufacturing Processes ◽  
Position Accuracy ◽  
Semiconductor Packaging ◽  
Thick Glass

Abstract Glasses are homogeneous, many glasses have excellent dielectric properties at GHz frequencies and some have thermal expansions (CTE) which are close to silicon. Ultrathin glasses (UTG) with thicknesses of 25 μm to 200 μm (0.001 to 0.0079 inch) offer numerous options for packaging, integration and co-processing in semiconductor manufacturing processes. We introduce SCHOTT UTG including paths to further improve their mechanical stability and strength. We use laser ablation in 50μm thick glass and show via fabrication with a potential of mass manufacturing with via diameters of 30μm, 38μm pitch and a position accuracy of +/− 1μm. The structures are metallized using sputtering and electroplating which leads to hermetic, tight conducting through glass-vias (TGV).

Structural and dielectric properties of Fe-substituted BST thin films grown by laser ablation

2005 ◽  
Vol 117 (1) ◽  
pp. 5-9 ◽  
Author(s):  
L. Radhapiyari ◽  
A.R. James ◽  
O.P. Thakur ◽  
Chandra Prakash
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Laser Ablation ◽  
Bst Thin Films

Dielectric Properties of BaTiO3Thin Films Prepared by Laser Ablation

2006 ◽  
Vol 45 (10A) ◽  
pp. 7806-7812 ◽  
Author(s):  
Junya Fujita ◽  
Keigo Suzuki ◽  
Nobuyuki Wada ◽  
Yukio Sakabe ◽  
Kazuo Takeuchi ◽  
...  
Keyword(s):  
Dielectric Properties ◽  
Laser Ablation

Dielectric properties of oriented thin films of PbZrO3 on Si produced by pulsed laser ablation

1998 ◽  
Vol 83 (12) ◽  
pp. 7808-7812 ◽  
Author(s):  
Soma Chattopadhyay ◽  
Pushan Ayyub ◽  
V. R. Palkar ◽  
M. S. Multani ◽  
S. P. Pai ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

Strained $\bf SrTiO_{3}/BaTiO_{3}$ Superlattices Formed by Laser Ablation Technique and Their High Dielectric Properties

1995 ◽  
Vol 34 (Part 1, No. 2A) ◽  
pp. 544-547 ◽  
Author(s):  
Hitoshi Tabata ◽  
Hidekazu Tanaka ◽  
Tomoji Kawai ◽  
Masanori Okuyama
Keyword(s):  
Dielectric Properties ◽  
Laser Ablation ◽  
Ablation Technique ◽  
High Dielectric ◽  
Laser Ablation Technique

Synthesis and dielectric properties of SrxBa1–xNb2O6 formed by YAG laser ablation

2001 ◽  
Vol 21 (10-11) ◽  
pp. 1569-1572 ◽  
Author(s):  
K. Kakimoto ◽  
H. Kakemoto ◽  
A. Baba ◽  
S. Fujita ◽  
Y. Masuda
Keyword(s):  
Dielectric Properties ◽  
Laser Ablation ◽  
Yag Laser

Electrode effects on the low-frequency dielectric properties of (Ba, Sr)TiO3 thin films prepared by pulsed laser ablation

1999 ◽  
Vol 24 (1-4) ◽  
pp. 33-43 ◽  
Author(s):  
Su-Jae Lee ◽  
Kwang-Yong Kang ◽  
Seok-Kil Han ◽  
Jin-Woo Kim ◽  
Sang-Don Jung
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Laser Ablation ◽  
Low Frequency ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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