Measurement of plasma density in the discharge maintained in a nonuniform gas flow by a high-power terahertz-wave gyrotron

2016 ◽  
Vol 23 (4) ◽  
pp. 043511 ◽  
Author(s):  
A. V. Sidorov ◽  
S. V. Razin ◽  
S. V. Golubev ◽  
M. I. Safronova ◽  
A. P. Fokin ◽  
...  
Keyword(s):  
Plasma Density ◽  
High Power ◽  
Gas Flow ◽  
Terahertz Wave ◽  
Nonuniform Gas

The Discharge Maintained by High-Power Terahertz Radiation in a Nonuniform Gas Flow

2014 ◽  
Vol 56 (8-9) ◽  
pp. 561-565 ◽  
Author(s):  
M. Yu. Glyavin ◽  
S. V. Golubev ◽  
V. G. Zorin ◽  
I. V. Izotov ◽  
A. G. Litvak ◽  
...  
Keyword(s):  
Terahertz Radiation ◽  
High Power ◽  
Gas Flow ◽  
Nonuniform Gas

Plasma density in discharge sustained in inhomogeneous gas flow by high-power radiation in the terahertz frequency range

2017 ◽  
Vol 43 (2) ◽  
pp. 186-189 ◽  
Author(s):  
A. V. Vodopyanov ◽  
M. Yu. Glyavin ◽  
S. V. Golubev ◽  
A. G. Luchinin ◽  
S. V. Razin ◽  
...  
Keyword(s):  
Plasma Density ◽  
High Power ◽  
Gas Flow ◽  
Terahertz Frequency ◽  
Frequency Range ◽  
Terahertz Frequency Range ◽  
Power Radiation ◽  
High Power Radiation ◽  
Inhomogeneous Gas

An analysis of the shielding gas flow from a coaxial conical nozzle during high power CO2laser welding

2006 ◽  
Vol 39 (3) ◽  
pp. 563-574 ◽  
Author(s):  
Antonio Ancona ◽  
Teresa Sibillano ◽  
Pietro Mario Lugarà ◽  
Giuseppe Gonnella ◽  
Giuseppe Pascazio ◽  
...  
Keyword(s):  
High Power ◽  
Gas Flow ◽  
Conical Nozzle ◽  
Shielding Gas

Influence of peak current on substrate plasma sheath properties of Ti films deposited by high-power pulsed magnetron sputtering

2019 ◽  
Vol 33 (01n03) ◽  
pp. 1940016
Author(s):  
C. Z. Chen ◽  
D. L. Ma ◽  
N. Huang ◽  
Y. X. Leng
Keyword(s):  
Magnetron Sputtering ◽  
Equivalent Circuit ◽  
Plasma Density ◽  
High Power ◽  
Equivalent Circuit Model ◽  
Film Structure ◽  
Circuit Model ◽  
Plasma Sheath ◽  
Peak Current ◽  
Pulsed Magnetron

For film deposition, the substrate sheath properties, such as the plasma density, ion-to-atom ratios around the substrate, are more important for the film structure. In this paper, titanium thin films were deposited on grounded substrates by high-power pulsed magnetron sputtering (HPPMS) with the peak current in the range of 113–185 A. A simple and new equivalent circuit model of the sheath was established to study the plasma density around the substrate sheath. The Ti ion-to-atom ratios near substrate were studied by optical emission spectroscopy (OES), and the film structure was detected by transmission electron microscopy (TEM). The results showed that the calculated plasma density was from 0.8 × 10[Formula: see text] to 1.4 × 10[Formula: see text] m[Formula: see text] at different peak current. These were consistent with the results measured by a modified one-grid ion collector using saturation current probe method, which proved our proposed equivalent circuit model was correct. The Ti ion-to-atom ratios around the substrate were estimated at about 24%–62%. The plasma density and ion to atom ratio around the substrate increased with the peak current, and this could lead to a higher film crystallization and preference growth on Ti (101) and (100).

Peculiarities of Excitation of Large-Scale Plasma Density Irregularities During Modification of the Ionospheric F 2 Region by High-Power HF Radio Waves

2016 ◽  
Vol 58 (10) ◽  
pp. 717-728 ◽  
Author(s):  
V. L. Frolov ◽  
E. A. Schorokhova ◽  
V. E. Kunitsyn ◽  
E. S. Andreeva ◽  
A. M. Padokhin
Keyword(s):  
Plasma Density ◽  
High Power ◽  
Large Scale ◽  
Radio Waves

Modeling of the FLEET Filament Interaction with a Nonuniform Gas Flow

2017 ◽  
Author(s):  
Matthew R. New-Tolley ◽  
Mikhail N. Shneider ◽  
Richard B. Miles
Keyword(s):  
Gas Flow ◽  
Nonuniform Gas

High-power terahertz-wave generation using DAST crystal and detection using mid-infrared powermeter

2007 ◽  
Vol 32 (19) ◽  
pp. 2885 ◽  
Author(s):  
Koji Suizu ◽  
Katsuhiko Miyamoto ◽  
Tomoyu Yamashita ◽  
Hiromasa Ito
Keyword(s):  
High Power ◽  
Terahertz Wave ◽  
Wave Generation ◽  
Mid Infrared
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