Advancement of highly charged ion beam production by superconducting ECR ion source SECRAL (invited)

2016 ◽  
Vol 87 (2) ◽  
pp. 02A707 ◽  
Author(s):  
L. Sun ◽  
J. W. Guo ◽  
W. Lu ◽  
W. H. Zhang ◽  
Y. C. Feng ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Beam Production ◽  
Highly Charged Ion

A new microwave coupling scheme for high intensity highly charged ion beam production by high power 24–28 GHz SECRAL ion source

2020 ◽  
Vol 91 (1) ◽  
pp. 013322 ◽  
Author(s):  
J. W. Guo ◽  
L. Sun ◽  
W. Lu ◽  
W. H. Zhang ◽  
Y. C. Feng ◽  
...  
Keyword(s):  
High Power ◽  
High Intensity ◽  
Ion Beam ◽  
Ion Source ◽  
Coupling Scheme ◽  
Beam Production ◽  
Highly Charged Ion

New development of laser ion source for highly charged ion beam production at Institute of Modern Physics (invited)

2016 ◽  
Vol 87 (2) ◽  
pp. 02A917 ◽  
Author(s):  
H. Y. Zhao ◽  
J. J. Zhang ◽  
Q. Y. Jin ◽  
W. Liu ◽  
G. C. Wang ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Laser Ion Source ◽  
Beam Production ◽  
New Development ◽  
Modern Physics ◽  
Highly Charged Ion

Intense heavy ion beam production from IMP LECR3 and construction progress of a superconducting ECR ion source SECRAL

2004 ◽  
Vol 75 (5) ◽  
pp. 1410-1413 ◽  
Author(s):  
H. W. Zhao ◽  
Z. M. Zhang ◽  
W. He ◽  
X. Z. Zhang ◽  
X. H. Guo ◽  
...  
Keyword(s):  
Ion Beam ◽  
Heavy Ion ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Beam Production ◽  
Heavy Ion Beam

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

1982 ◽  
Vol 21 (Part 2, No. 1) ◽  
pp. L4-L6 ◽  
Author(s):  
Seitaro Matsuo ◽  
Yoshio Adachi
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam ◽  
Reactive Ion Beam Etching

Numerical simulation multicomponent ion beam transport from ECR ion source

2004 ◽  
Vol 75 (5) ◽  
pp. 1494-1496 ◽  
Author(s):  
L. Ma ◽  
M. T. Song ◽  
Z. M. Zhang ◽  
Y. Cao ◽  
X. Y. Chen
Keyword(s):  
Numerical Simulation ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Transport ◽  
Ecr Ion Source
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