Electron density dependence of impedance probe plasma potential measurements

2015 ◽  
Vol 22 (8) ◽  
pp. 083505 ◽  
Author(s):  
D. N. Walker ◽  
D. D. Blackwell ◽  
W. E. Amatucci
Keyword(s):  
Density Dependence ◽  
Electron Density ◽  
Plasma Potential ◽  
Impedance Probe

Magnetic Field and Geometry Effects on Finding Plasma Potential with a Cylindrical Impedance Probe

2012 ◽  
Author(s):  
David N. Walker ◽  
R. F. Fernsler ◽  
D. D. Blackwell ◽  
W. E. Amatucci
Keyword(s):  
Magnetic Field ◽  
Plasma Potential ◽  
Impedance Probe ◽  
Geometry Effects

Study on Electron Density Dependence of Metastable Ar+Density in Pulsed-Discharge Plasma by Using LIF Method

1987 ◽  
Vol 26 (Part 1, No. 1) ◽  
pp. 184-185
Author(s):  
Yukio Watanabe ◽  
Masaharu Shiratani ◽  
Sukeomi Ogi ◽  
Naoki Kunihiro
Keyword(s):  
Density Dependence ◽  
Electron Density ◽  
Discharge Plasma ◽  
Pulsed Discharge ◽  
Pulsed Discharge Plasma

Electron Density Dependence of the Excitonic Absorption Thresholds of GaAs Quantum Wells

2000 ◽  
Vol 178 (1) ◽  
pp. 465-470 ◽  
Author(s):  
R. Kaur ◽  
A.J. Shields ◽  
J.L. Osborne ◽  
M.Y. Simmons ◽  
D.A. Ritche ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Density Dependence ◽  
Electron Density ◽  
Excitonic Absorption

Using rf impedance probe measurements to determine plasma potential and the electron energy distribution

2010 ◽  
Vol 17 (11) ◽  
pp. 113503 ◽  
Author(s):  
D. N. Walker ◽  
R. F. Fernsler ◽  
D. D. Blackwell ◽  
W. E. Amatucci
Keyword(s):  
Energy Distribution ◽  
Electron Energy ◽  
Plasma Potential ◽  
Electron Energy Distribution ◽  
Impedance Probe ◽  
Probe Measurements

Pressure and Electron Density Dependence of the Electron-Ion Recombination Coefficient in Helium

1970 ◽  
Vol 1 (3) ◽  
pp. 887-896 ◽  
Author(s):  
Jacques Berlande ◽  
Michel Cheret ◽  
Robert Deloche ◽  
Alain Gonfalone ◽  
Claude Manus
Keyword(s):  
Density Dependence ◽  
Electron Density ◽  
Recombination Coefficient ◽  
Ion Recombination

Electron Density Dependence of Extreme Ultraviolet Line Intensity Ratios in Ar XIV

2021 ◽  
Vol 921 (2) ◽  
pp. 115
Author(s):  
Nobuyuki Nakamura ◽  
Naoki Numadate ◽  
Yasutaka Kono ◽  
Izumi Murakami ◽  
Daiji Kato ◽  
...  
Keyword(s):  
Density Dependence ◽  
Electron Density ◽  
Line Intensity ◽  
Extreme Ultraviolet ◽  
Intensity Ratios

Helicon Plasma Discharge for Processing Wall Material

2014 ◽  
Vol 513-517 ◽  
pp. 28-32
Author(s):  
T.Y. Huang ◽  
C.G. Jin ◽  
M.Z. Wu ◽  
L.J. Zhuge ◽  
X.M. Wu
Keyword(s):  
Magnetic Field ◽  
Electron Density ◽  
Langmuir Probe ◽  
Plasma Processing ◽  
Plasma Potential ◽  
Graphite Surface ◽  
Wall Material ◽  
Helicon Plasma ◽  
Helicon Wave ◽  
Ar Gas

A helicon wave plasma (HWP) discharge with strong magnetic field was investigated. The HWP was produced with an internal Nagoya III antenna that is perpendicular to the magnetic field and driven by a 13.56 MHz radio-frequency (RF) source. HWP was characterized in terms of electron density, electron temperature and plasma potential using a single Langmuir probe in Ar gas. The result of Langmuir probe shows that the electron density increases with RF power, but saturate above 700 W at a density of 2×1019m-3. Scanning electron microscopy (SEM) was extensively used to characterize the quality of the graphite surface. The result of SEM shows the surface of graphite that exposed to plasma processing has exhibited smoother and compacter surface topography. Meanwhile, the concentration of impurity on the graphite surface decreases with plasma processing.

scholarly journals Electron density and electron neutral collision frequency in the ionosphere using plasma impedance probe measurements

2008 ◽  
Vol 113 (A9) ◽  
pp. n/a-n/a ◽  
Author(s):  
E. Spencer ◽  
S. Patra ◽  
T. Andriyas ◽  
C. Swenson ◽  
J. Ward ◽  
...  
Keyword(s):  
Electron Density ◽  
Collision Frequency ◽  
Plasma Impedance ◽  
Impedance Probe ◽  
Probe Measurements
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