scholarly journals Transport and capture properties of Auger-generated high-energy carriers in (AlInGa)N quantum well structures

2015 ◽  
Vol 118 (3) ◽  
pp. 033103 ◽  
Author(s):  
A. Nirschl ◽  
M. Binder ◽  
M. Schmid ◽  
M. M. Karow ◽  
I. Pietzonka ◽  
...  
1988 ◽  
Vol 144 ◽  
Author(s):  
F. D. Schowengerdt ◽  
F. J. Grunthaner ◽  
John K. Liu

ABSTRACTWe report on a systematic study of the composition and structure of GaAs/InAs/GaAs quantum wells using Auger Electron Spectroscopy (AES), Extended Energy Loss Fine Structure (EELFS), and Reflection High Energy Electron Diffraction (RHEED) techniques. Double heterostructures with InAs thickness ranging from 2 to 10 monolayers, capped by 2 to 10 monolayers of GaAs, were grown by MBE using a variety of techniques, including those employing sequential, interrupted, and delayed shutter timing sequences. AES peak ratios are compared with model calculations to monitor compositional development of the multilayers. The AES results are correlated with RHEED measurements to determine MBE growth parameters for optimal control of the stoichiometry and surface morphology. EELFS was used to monitor strain in the buried InAs layers. The AES results show departure from smooth laminar growth of layers of stoichiometric InAs on GaAs at temperatures below 420 C and above 470 C. AES results on the quantum well structures suggest floating InAs layers on top of the GaAs and/or facet formation in the GaAs layers. The EELFS results, when compared to bulk InAs, indicate the presence of strain in the buried InAs quantum well.


1995 ◽  
Vol 396 ◽  
Author(s):  
R. D. Goldberg ◽  
I. V. Mitchell ◽  
S. Charbonneau ◽  
P. Poole ◽  
E. S. Koteles ◽  
...  

AbstractSignificant progress has been made in the past year in the use of high energy (MeV) ion irradiation to tune the bandgap and therefore emission wavelengths of single and multiple quantum well structures. These shifts are attributable to compositional mixing across the well and barrier layer interfaces, a process that is driven by the vacancy flux, released during the anneal stage, from radiation defects. We present data from a series of measurements in both GaAs- and InP-based QW structures to demonstrate the importance of the implantation parameters chosen (ion species, energy, flux, fluence and implant temperature). The dramatic difference in the response of these two systems with regard to the implant depth is believed to be associated with the very different diffusivities of the Gp III site vacancies. Prospects for implementing the irradiation approach as a spatially selective, planar process in integrated optoelectronic circuitry look very attractive and are illustrated for both passive and active components by reference to recent results from tuned wavelength lasers.


1995 ◽  
Vol 146 (1-4) ◽  
pp. 422-426 ◽  
Author(s):  
N. Hoffmann ◽  
J. Griesche ◽  
W. Heimbrodt ◽  
V. Weinhold ◽  
K. Jacobs

1996 ◽  
Vol 43 (8) ◽  
pp. 1657-1669 ◽  
Author(s):  
SHARMILA BANERJEE and PRANAY K SEN

1987 ◽  
Vol 48 (C5) ◽  
pp. C5-457-C5-461
Author(s):  
C. J. SUMMERS ◽  
K. F. BRENNAN ◽  
A. TORABI ◽  
H. M. HARRIS ◽  
J. COMAS

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