Design, installation, commissioning and operation of a beamlet monitor in the negative ion beam test stand at NIFS

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2020 ◽  
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AbstractUsing a newly developed ion beam apparatus, PANDA (Positive And Negative ions Deposition Apparatus), carbon nitride films were prepared by simultaneous deposition of mass-analyzed low energy positive and negative ions such as C2-, N+, under ultra high vacuum conditions, in the order of 10−6 Pa on silicon wafer. The ion energy was varied from 50 to 400 eV. The film properties as a function of their beam energy were evaluated by Rutherford Backscattering Spectrometry (RBS), Fourier Transform Infrared spectroscopy (FTIR) and Raman scattering. From the results, it is suggested that the C-N triple bond contents in films depends on nitrogen ion energy.


2016 ◽  
Vol 87 (2) ◽  
pp. 02B917 ◽  
Author(s):  
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T. J. Maceina ◽  
P. Veltri ◽  
M. Cavenago ◽  
G. Serianni

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