Gas phase diagnostics during silicon carbide films deposition using very high frequency - plasma enhanced chemical vapor deposition

2015 ◽  
Author(s):  
N. Mustapha ◽  
M. F. Omar ◽  
A. K. Ismail ◽  
J. Zainal ◽  
R. K. Raja Ibrahim
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition

2010 ◽  
Vol 518 (8) ◽  
pp. 2124-2127 ◽  
Author(s):  
Doo Sup Hwang ◽  
Seung Yoon Lee ◽  
Heon Min Lee ◽  
Sang Jin Kim ◽  
Gil Jun Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Plasma Source ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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