Gas-dynamic acceleration of laser-ablation plumes: Hyperthermal particle energies under thermal vaporization

2015 ◽  
Vol 106 (5) ◽  
pp. 054107 ◽  
Author(s):  
A. A. Morozov ◽  
A. B. Evtushenko ◽  
A. V. Bulgakov
2018 ◽  
Vol 167 ◽  
pp. 03011
Author(s):  
Jenn-Kun Kuo ◽  
Pei-Hsing Huang ◽  
Shih-Kai Chien ◽  
Kuang-Yao Huang ◽  
Kun-Tso Chen

In this study, we employed molecular dynamics (MD) simulations to investigate ablation induced by the application of pulsed laser irradiation to a thin α-Fe substrate. We observed several mechanisms underlying the removal of material, including ultrafast melting, cluster ejection, and thermal vaporization. We also examined the effects of laser fluence on the resulting surface morphology as well as the amount of material ablated and deposited around the craters


2000 ◽  
Vol 154-155 ◽  
pp. 66-72 ◽  
Author(s):  
A.V. Gusarov ◽  
A.G. Gnedovets ◽  
I. Smurov

1992 ◽  
Vol 7 (5) ◽  
pp. 1152-1157 ◽  
Author(s):  
P.E. Dyer ◽  
S.T. Lau ◽  
G.A. Oldershaw ◽  
D. Schudel

The XeCl laser ablation of a polyetheretherketone (PEEK)-carbon fiber composite (APC-2) is reported. Etch rates and measurements of the ablation products have been carried out, together with scanning electron microscope evaluation of the etch craters. Selective removal of the PEEK matrix occurs for fluences ∼70–400 mJ cm−2. Net composite etching commences at ∼420 mJ cm−2, with an etch rate above this value that is determined by the carbon fibers and is consistent with thermal vaporization at high temperature (≥4000 K).


Author(s):  
M. Grant Norton ◽  
C. Barry Carter

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.


2007 ◽  
Vol 177 (4S) ◽  
pp. 52-52
Author(s):  
Joshua M. Stem ◽  
Jer-Tsang Hsieh ◽  
Sangtae Park ◽  
Yair Lotan ◽  
Jeffrey A. Cadeddu

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