Ballistic electron transport calculation of strained germanium-tin fin field-effect transistors

2014 ◽  
Vol 104 (19) ◽  
pp. 192101 ◽  
Author(s):  
H.-S. Lan ◽  
C. W. Liu
1982 ◽  
Vol 35 (6) ◽  
pp. 749
Author(s):  
PH Ladbrooke ◽  
DR Debuf ◽  
K Nanayakkara ◽  
DR Wilkins

A review is given of the physical and technological factors which affect the electrical behaviour of field-effect devices for high-speed applications. Ballistic electron transport is shown to lead to an electron transit time under the gate electrode which is shorter in GaAs than in Si field-effect transistors (FETs), providing a possible basis for exploitation of transport effects in high-speed devices. Some electrical characteristics of practical Si and GaAs field-effect structures are presented.


2021 ◽  
Vol 118 (4) ◽  
pp. 042105
Author(s):  
Junao Cheng ◽  
Hao Yang ◽  
Nicholas G. Combs ◽  
Wangzhou Wu ◽  
Honggyu Kim ◽  
...  

2014 ◽  
Vol 104 (20) ◽  
pp. 203102 ◽  
Author(s):  
A. A. Shevyrin ◽  
A. G. Pogosov ◽  
M. V. Budantsev ◽  
A. K. Bakarov ◽  
A. I. Toropov ◽  
...  

2016 ◽  
Vol 42 (9) ◽  
pp. 970-972 ◽  
Author(s):  
A. A. Borisov ◽  
S. S. Zyrin ◽  
A. A. Makovetskaya ◽  
V. I. Novoselets ◽  
A. B. Pashkovskii ◽  
...  

1999 ◽  
Author(s):  
Kong-Thon F. Tsen ◽  
David K. Ferry ◽  
Jyh-Shyang Wang ◽  
Chao-Hsiung Huang ◽  
Hao-Hsiung Lin

2004 ◽  
Vol 93 (24) ◽  
Author(s):  
O. Gunawan ◽  
Y. P. Shkolnikov ◽  
E. P. De Poortere ◽  
E. Tutuc ◽  
M. Shayegan

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