Development of silicon electrode enhanced by carbon nanotube and gold nanoparticle composites on silicon neural probe fabricated with complementary metal-oxide-semiconductor process

2014 ◽  
Vol 104 (19) ◽  
pp. 193105 ◽  
Author(s):  
Songsong Zhang ◽  
Wei Mong Tsang ◽  
Merugu Srinivas ◽  
Tao Sun ◽  
Navab Singh ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Metal Oxide ◽  
Gold Nanoparticle ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Neural Probe ◽  
Nanoparticle Composites ◽  
Semiconductor Process

A Complementary Metal Oxide Semiconductor Process-Compatible Ferroelectric Tunnel Junction

2017 ◽  
Vol 9 (15) ◽  
pp. 13262-13268 ◽  
Author(s):  
Fabian Ambriz-Vargas ◽  
Gitanjali Kolhatkar ◽  
Maxime Broyer ◽  
Azza Hadj-Youssef ◽  
Rafik Nouar ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Tunnel Junction ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Ferroelectric Tunnel Junction ◽  
Semiconductor Process

Magnetotransistors sensitive to a magnetic field applied in two different directions

1991 ◽  
Vol 69 (3-4) ◽  
pp. 170-173
Author(s):  
M. Doan ◽  
Lj. Ristic
Keyword(s):  
Magnetic Field ◽  
Metal Oxide ◽  
Basic Principle ◽  
Magnetic Induction ◽  
Linear Response ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Base Region ◽  
Semiconductor Process

A lateral magnetotransistor that is sensitive to a magnetic field applied either parallel or perpendicular to the chip's surface is reported. It is fabricated using the standard complementary metal oxide semiconductor process. The deflection of the carriers in the base region is considered as the basic principle of operation. The device shows a linear response to a magnetic field in both directions. The minimum magnetic induction to be detected is in the order of 10 μT at f = 1 kHz.

Formation of cobalt silicide spikes in 0.18 μm complementary metal oxide semiconductor process

2001 ◽  
Vol 78 (20) ◽  
pp. 3091-3093 ◽  
Author(s):  
J. Y. Dai ◽  
Z. R. Guo ◽  
S. F. Tee ◽  
C. L. Tay ◽  
Eddie Er ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Cobalt Silicide ◽  
Semiconductor Process
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