Relation between plasma plume density and gas flow velocity in atmospheric pressure plasma

2014 ◽  
Vol 21 (4) ◽  
pp. 043511 ◽  
Author(s):  
Kiyoyuki Yambe ◽  
Shogo Taka ◽  
Kazuo Ogura
Keyword(s):  
Flow Velocity ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Plume ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma ◽  
Gas Flow Velocity

scholarly journals Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Cost Savings ◽  
Historical Background ◽  
Pressure Plasma ◽  
Wide Range ◽  
The Status ◽  
Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

Effects of sheath gas flow on He atmospheric pressure plasma jet

2019 ◽  
Vol 12 (3) ◽  
pp. 036001 ◽  
Author(s):  
Kotaro Ogawa ◽  
Hideki Yajima ◽  
Jun-Seok Oh ◽  
Hiroshi Furuta ◽  
Akimitsu Hatta
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma

Atmospheric Pressure Plasma Jets for 2D and 3D Materials Processing

2005 ◽  
Vol 107 ◽  
pp. 119-124 ◽  
Author(s):  
Jacek Kędzierski ◽  
Jürgen Engemann ◽  
Markus Teschke ◽  
Dariusz Korzec
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Atmospheric Pressure Plasma ◽  
Cylindrical Symmetry ◽  
Plasma Jets ◽  
Partial Explanation ◽  
Plasma Gun ◽  
Pressure Plasma ◽  
Model Formation ◽  
2D And 3D

A novel atmospheric pressure plasma jet with a cylindrical symmetry i.e. a tubular dielectric barrier and two tubular electrodes was developed at Microstructure Research Center – fmt, Wuppertal, Germany. The jet was investigated by means of ultra fast (down to tens of nanoseconds exposition time) ICCD photography and regular CCD photography. Some spectacular results were achieved and their partial explanation was presented. The jet acts as a “plasma gun” throwing small “plasma bullets” out of its orifice. The most important findings are: (i) the bullet velocity is approximately 3 orders of magnitude larger than the gas flow velocity, and (ii) the jet dynamics is mainly electrical field controlled. A simple model - formation of a jet in air - based on a Helium metastables core can explain qualitatively reasonably well most of our experimental observations. Some variations of the original cylindrical jet geometry were presented and discussed: microjet and fmt Plasma-Pen, single tube multijet, tube-in-tube single and multijet systems (so-called “Wuppertal-Approach”).

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