Two-surface-plasmon-polariton-absorption based lithography using 400 nm femtosecond laser
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2012 ◽
Vol 51
(4S)
◽
pp. 04DG03
◽
2012 ◽
Vol 51
◽
pp. 04DG03
◽
2007 ◽
Vol 253
(19)
◽
pp. 8304-8308
◽
2010 ◽
pp. 549-552