Decomposition kinetics of silicon oxide layers on silicon substrates during annealing in vacuum
Keyword(s):
Keyword(s):
Fluorine-free high-resolution selective plasma etching of silicon-oxide layers on silicon substrates
2010 ◽
Vol 43
(39)
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pp. 395402
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2016 ◽
Vol 10
(3)
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pp. 325-328
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2019 ◽
1995 ◽
Vol 20
(2)
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pp. 91-95
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1971 ◽
Vol 15
(1)
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pp. 91-103
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