A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices
Keyword(s):
Keyword(s):
1980 ◽
pp. 581-600
Keyword(s):
2012 ◽
pp. 131-144
Keyword(s):
1980 ◽
Vol 36
(2)
◽
pp. 316-321
◽
1965 ◽
Vol 37
(3)
◽
pp. 402-405
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