Band offsets and dielectric properties of the amorphous Si3N4/Si(100) interface: A first-principles study

2013 ◽  
Vol 102 (24) ◽  
pp. 241603 ◽  
Author(s):  
T. Anh Pham ◽  
Tianshu Li ◽  
Huy-Viet Nguyen ◽  
Sadasivan Shankar ◽  
Francois Gygi ◽  
...  
2005 ◽  
Vol 486 (1-2) ◽  
pp. 136-140 ◽  
Author(s):  
Takenori Yamamoto ◽  
Hiroyoshi Momida ◽  
Tomoyuki Hamada ◽  
Tsuyoshi Uda ◽  
Takahisa Ohno

2011 ◽  
Author(s):  
H. R. Sreepad ◽  
K. P. S. S. Hembram ◽  
Umesh V. Waghmare ◽  
Alka B. Garg ◽  
R. Mittal ◽  
...  

2019 ◽  
Vol 103 (3) ◽  
pp. 1912-1926
Author(s):  
Qian Chen ◽  
Feng Gao ◽  
Jie Xu ◽  
Changying Wu ◽  
Shuyao Cao ◽  
...  

2002 ◽  
Vol 66 (15) ◽  
Author(s):  
Masayoshi Mikami ◽  
Shinichiro Nakamura ◽  
Osamu Kitao ◽  
Hironori Arakawa

1997 ◽  
Vol 482 ◽  
Author(s):  
J. A. Majewski ◽  
M. Städele

AbstractWe present a first-principles study of heteroepitaxial interfaces between GaN and both cubic as well as wurtzite AlN substrates oriented along main cubic or hexagonal directions and of stacking fault interfaces between cubic and wurtzite GaN. Our calculations show that all studied heterostructures are of type I. Valence band offsets for GaN/AlN are nearly independent of the substrate orientation and of the order of 0.8 eV. The valence and conduction band offsets for a stacking fault interface are predicted to be 40 meV and 175 meV, respectively.


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