Medium range order engineering in amorphous silicon thin films for solid phase crystallization

2013 ◽  
Vol 113 (19) ◽  
pp. 193511 ◽  
Author(s):  
Felix Law ◽  
Per I. Widenborg ◽  
Joachim Luther ◽  
Bram Hoex
Keyword(s):  
Thin Films ◽  
Amorphous Silicon ◽  
Solid Phase ◽  
Range Order ◽  
Solid Phase Crystallization ◽  
Medium Range Order ◽  
Silicon Thin Films ◽  
Medium Range

Directional Field Aided Lateral Crystallization of Amorphous Silicon Thin Films

2001 ◽  
Vol 664 ◽  
Author(s):  
Marek A. T. Izmajlowicz ◽  
Neil A. Morrison ◽  
Andrew J. Flewitt ◽  
William I. Milne
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Electric Field ◽  
Amorphous Silicon ◽  
Solid Phase ◽  
Excimer Laser Annealing ◽  
Solid Phase Crystallization ◽  
Metal Induced Crystallization ◽  
Silicon Thin Films ◽  
Induced Crystallization

ABSTRACTFor application to active matrix liquid crystal displays (AMLCDs), a low temperature (< 600 °C) process for the production of polycrystalline silicon is required to permit the use of inexpensive glass substrates. This would allow the integration of drive electronics onto the display panel. Current low temperature processes include excimer laser annealing, which requires expensive equipment, and solid phase crystallization, which requires high temperatures. It is known that by adding small amounts of metals such as nickel to the amorphous silicon the solid phase crystallization temperature can be significantly reduced. The rate of this solid phase metal induced crystallization is increased in the presence of an electric field. Previous work on field aided crystallization has reported crystal growth that either proceeds towards the positive terminal or is independent of the direction of the electric field. In this work, extensive investigation has consistently revealed directional crystallization, from the positive to the negative terminal, of amorphous silicon thin films during heat treatment in the presence of an electric field. This is the first time that this phenomenon has been reported. Models have been proposed for metal induced crystallization with and without an applied electric field in which a reaction between Ni and Si to produce NiSi is the rate-limiting step. The crystallization rate is increased in the presence of an electric field through the drift of positive Ni ions.

scholarly journals The Substrate Effects on Kinetics and Mechanism of Solid-Phase Crystallization of Amorphous Silicon Thin Films

ETRI Journal ◽  
1997 ◽  
Vol 19 (1) ◽  
pp. 25-34 ◽  
Author(s):  
Yoon-Ho Song Song ◽  
Seung-Youl Kang Kang ◽  
Kyoung Ik Cho Cho ◽  
Hyung Joun Yoo Yoo
Keyword(s):  
Thin Films ◽  
Amorphous Silicon ◽  
Solid Phase ◽  
Kinetics And Mechanism ◽  
Solid Phase Crystallization ◽  
Substrate Effects ◽  
Silicon Thin Films

Plasma Deposition of Silicon Clusters: A Way to Produce Silicon Thin Films With Medium-Range Order ?

1998 ◽  
Vol 507 ◽  
Author(s):  
P. Roca i Cabarrocas
Keyword(s):  
Thin Films ◽  
Transport Properties ◽  
Plasma Deposition ◽  
Random Network ◽  
Range Order ◽  
Homogeneous Material ◽  
Silicon Clusters ◽  
Medium Range Order ◽  
Silicon Thin Films ◽  
Medium Range

ABSTRACTThe growth of hydrogenated amorphous silicon films is often explained by the arrival of SiHx radicals on the substrate and the subsequent cross-linking reactions leading to an homogeneous material which can be described by a continuous random network. Here we summarize our recent Work on a new class of silicon thin films produced under plasma conditions where silicon clusters and radicals contribute to the deposition. The main aspects are: i) silicon clusters with sizes of the order of 1-5 nm are easily formed in silane plasmas; ii) these silicon clusters can contribute to the deposition and lead to the formation of films with medium-range order (“polymorphous silicon”); iii) despite their heterogeneity, the films have improved transport properties and stability with respect to a-Si:H. The excellent transport properties are confirmed by the achievement of stable single junction p-i-n solar cells with efficiencies close to 10 %.

The Structure of Ion-Implanted Amorphous Silicon

1998 ◽  
Vol 540 ◽  
Author(s):  
J. M. Gibson ◽  
J-Y. Cheng ◽  
P. Voyles ◽  
M.M.J. TREACY ◽  
D.C. Jacobson
Keyword(s):  
Amorphous Silicon ◽  
Network Model ◽  
Random Network ◽  
Amorphous Semiconductors ◽  
Range Order ◽  
Medium Range Order ◽  
Medium Range ◽  
Large Heat ◽  
Continuous Random Network ◽  
Ion Implanted

AbstractUsing fluctuation microscopy, we show that ion-implanted amorphous silicon has more medium-range order than is expected from the continuous random network model. From our previous work on evaporated and sputtered amorphous silicon, we conclude that the structure is paracrystalline, i.e. it possesses crystalline-like order which decays with distance from any point. The observation might pose an explanation for the large heat of relaxation that is evolved by ion-implanted amorphous semiconductors.

Medium-Range Order of Amorphous Silicon Germanium Alloys: Small-Angle X-Ray Scattering Study

1989 ◽  
Vol 28 (Part 2, No. 7) ◽  
pp. L1092-L1095 ◽  
Author(s):  
Shin-ichi Muramatsu ◽  
Toshikazu Shimada ◽  
Hiroshi Kajiyama ◽  
Kazufumi Azuma ◽  
Takeshi Watanabe ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Small Angle ◽  
Silicon Germanium ◽  
Range Order ◽  
Medium Range Order ◽  
X Ray ◽  
X Ray Scattering ◽  
Medium Range ◽  
Scattering Study ◽  
Amorphous Silicon Germanium

Hydrogen-Induced Reduction in Medium Range Order of a-Si Thin Films Observed using Fluctuation Electron Microscopy

2004 ◽  
Vol 10 (S02) ◽  
pp. 802-803
Author(s):  
Lakshmi Narayana Nittala ◽  
Sreenivas Jayaraman ◽  
Brent A Sperling ◽  
John R Abelson
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Range Order ◽  
Medium Range Order ◽  
Medium Range ◽  
Fluctuation Electron Microscopy

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

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