Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment

C. Villeneuve-Faure; K. Makasheva; C. Bonafos; B. Despax; L. Boudou; P. Pons; G. Teyssedre

doi:10.1063/1.4805026

Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment

Journal of Applied Physics ◽

10.1063/1.4805026 ◽

2013 ◽

Vol 113 (20) ◽

pp. 204102 ◽

Cited By ~ 16

Author(s):

C. Villeneuve-Faure ◽

K. Makasheva ◽

C. Bonafos ◽

B. Despax ◽

L. Boudou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Pulsed Plasma ◽

Force Microscopy ◽

Microscopy Characterization ◽

Charging Effect

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Characterization of Surface Metal Particulate Contamination Using the Polysilicon Chemical Vapor Deposition Process

Particles on Surfaces 3 ◽

10.1007/978-1-4899-2367-7_12 ◽

1991 ◽

pp. 143-152 ◽

Cited By ~ 1

Author(s):

William A. Syverson ◽

Paul J. Schubring

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Particulate Contamination ◽

Surface Metal ◽

Vapor Deposition Process

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Characterization of the polyurea polymeric waveguides fabricated using the chemical vapor deposition process

Optics & Laser Technology ◽

10.1016/j.optlastec.2007.09.006 ◽

2008 ◽

Vol 40 (4) ◽

pp. 607-613

Author(s):

Shug-June Hwang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80227-3 ◽

1991 ◽

Vol 137-138 ◽

pp. 741-744 ◽

Cited By ~ 11

Author(s):

C. Wang ◽

G. Lucovsky ◽

R.J. Nemanich

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Remote Plasma ◽

Vapor Deposition Process

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Production and characterization of wear resistant Ti(C,N) coatings manufactured by modified chemical vapor deposition process

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.09.013 ◽

2010 ◽

Vol 205 (7) ◽

pp. 2322-2327 ◽

Cited By ~ 24

Author(s):

José Garcia ◽

Reinhard Pitonak ◽

Ronald Weissenbacher ◽

Arno Köpf

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Wear Resistant ◽

Vapor Deposition Process

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ANALYSIS OF HEAT AND MASS TRANSFER DURING MULTI-WAFER LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS

Proceeding of International Heat Transfer Conference 11 ◽

10.1615/ihtc11.240 ◽

1998 ◽

Author(s):

K.S. Park ◽

M. Choi

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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An analysis of the effect of the solid layer for the modified chemical vapor deposition process

Wärme- und Stoffübertragung ◽

10.1007/bf01541187 ◽

1993 ◽

Vol 28 (4) ◽

pp. 169-176 ◽

Cited By ~ 5

Author(s):

Y. T. Lin ◽

M. Choi ◽

R. Greif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Solid Layer ◽

Vapor Deposition Process

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The Modified Chemical Vapor Deposition Process in a Concentric Annulus: An Extension for Focused High-Rate Deposition

Aerosol Science and Technology ◽

10.1080/02786828808959211 ◽

1988 ◽

Vol 9 (3) ◽

pp. 237-249 ◽

Cited By ~ 18

Author(s):

M. Fiebig ◽

M. Hilgenstock ◽

H.-A. Riemann

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Chemical Vapor Deposition Process ◽

Concentric Annulus ◽

Vapor Deposition Process

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In Situ Monitoring of the Products from the SiH4 + WF 6 Tungsten Chemical Vapor Deposition Process by Micro‐Volume Mass Spectrometry

Journal of The Electrochemical Society ◽

10.1149/1.2221130 ◽

1993 ◽

Vol 140 (12) ◽

pp. 3588-3590 ◽

Cited By ~ 8

Author(s):

Roger W. Cheek ◽

Jeffry A. Kelber ◽

James G. Fleming ◽

Robert S. Blewer ◽

Richard D. Lujan

Keyword(s):

Mass Spectrometry ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

In Situ Monitoring ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Effect of Si–H Bond on the Gas-Phase Chemistry of Trimethylsilane in the Hot Wire Chemical Vapor Deposition Process

The Journal of Physical Chemistry A ◽

10.1021/jp203966h ◽

2011 ◽

Vol 115 (37) ◽

pp. 10290-10298 ◽

Cited By ~ 17

Author(s):

Y. J. Shi ◽

X. M. Li ◽

R. Toukabri ◽

L. Tong

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Hot Wire ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Vapor Deposition Process

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GaAs crystal growth from coordination compounds using the organometallic chemical vapor deposition process for solar cells

Solar & Wind Technology ◽

10.1016/0741-983x(86)90044-5 ◽

1986 ◽

Vol 3 (1) ◽

pp. 21-25

Author(s):

A. Zaouk ◽

G. Constant

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Crystal Growth ◽

Vapor Deposition ◽

Coordination Compounds ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Gaas Crystal ◽

Vapor Deposition Process

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