Binary nucleation kinetics. V. Φ lines and evaporation rate surfaces

1999 ◽  
Vol 110 (2) ◽  
pp. 1202-1211 ◽  
Author(s):  
Barbara E. Wyslouzil ◽  
Gerald Wilemski
Keyword(s):  
Evaporation Rate ◽  
Nucleation Kinetics ◽  
Binary Nucleation

Binary nucleation kinetics. I. Self‐consistent size distribution

1995 ◽  
Vol 103 (3) ◽  
pp. 1127-1136 ◽  
Author(s):  
Gerald Wilemski ◽  
Barbara E. Wyslouzil
Keyword(s):  
Size Distribution ◽  
Nucleation Kinetics ◽  
Binary Nucleation ◽  
Self Consistent

Erratum: Binary nucleation kinetics: A matrix method [J. Chem. Phys. 101, 9997 (1994)]

1997 ◽  
Vol 106 (7) ◽  
pp. 2987-2987
Author(s):  
Hanna Arstila ◽  
Pentti Paatero ◽  
Markku Kulmala ◽  
Ari Laaksonen
Keyword(s):  
Matrix Method ◽  
Chem Phys ◽  
Nucleation Kinetics ◽  
Binary Nucleation

Binary nucleation kinetics. III. Transient behavior and time lags

1996 ◽  
Vol 105 (3) ◽  
pp. 1090-1100 ◽  
Author(s):  
Barbara E. Wyslouzil ◽  
Gerald Wilemski
Keyword(s):  
Transient Behavior ◽  
Time Lags ◽  
Nucleation Kinetics ◽  
Binary Nucleation

Binary nucleation kinetics: A matrix method

1994 ◽  
Vol 101 (11) ◽  
pp. 9997-10002 ◽  
Author(s):  
Hanna Vehkamäki ◽  
Pentti Paatero ◽  
Markku Kulmala ◽  
Ari Laaksonen
Keyword(s):  
Matrix Method ◽  
Nucleation Kinetics ◽  
Binary Nucleation

Binary Nucleation Kinetics. 6. Partially Miscible Systems†

2001 ◽  
Vol 105 (47) ◽  
pp. 11566-11573 ◽  
Author(s):  
Barbara E. Wyslouzil ◽  
Shuyu Chen
Keyword(s):  
Nucleation Kinetics ◽  
Partially Miscible ◽  
Binary Nucleation

Hole Formation in Gold Films

1972 ◽  
Vol 30 ◽  
pp. 510-511
Author(s):  
R. W. Vook ◽  
R. Cook ◽  
R. Ziemer
Keyword(s):  
Deposition Rate ◽  
Quartz Crystal ◽  
Evaporation Rate ◽  
Gold Films ◽  
Hole Density ◽  
Hole Formation ◽  
Microscope Slide ◽  
Crystal Film ◽  
Glass Microscope Slide ◽  
Glass Microscope

During recent experiments on Au films, a qualitative correlation between hole formation and deposition rate was observed. These early studies were concerned with films 80 to 1000A thick deposited on glass at -185°C and annealed at 170°C. In the present studies this earlier work was made quantitative. Deposition rates varying between 5 and 700 A/min were used. The effects of deposition rate on hole density for two films 300 and 700A thick were investigated.Au was evaporated from an outgassed W filament located 10 cm from a glass microscope slide substrate and a quartz crystal film thickness monitor. A shutter separating the filament from the substrate and monitor made it possible to obtain a constant evaporation rate before initiating deposition. The pressure was reduced to less than 1 x 10-6 torr prior to cooling the substrate with liquid nitrogen. The substrate was cooled in 15 minutes during which the pressure continued to drop to the mid 10-7 torr range, where deposition was begun.

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