Strange hardness characteristic of hydrogenated diamond-like carbon thin film by plasma enhanced chemical vapor deposition process

2013 ◽  
Vol 102 (1) ◽  
pp. 011917 ◽  
Author(s):  
Neeraj Dwivedi ◽  
Sushil Kumar ◽  
Hitendra K. Malik
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Diamond Like Carbon ◽  
Carbon Thin Film ◽  
Vapor Deposition Process

scholarly journals A Review CHEMICAL VAPOR DEPOSITION : PROCESS AND APPLICATION

2018 ◽  
Author(s):  
Agil Aditya Dinata ◽  
Abel Maaruf Rosyadi ◽  
Syukri Hamid ◽  
Rahadian Zainul
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Film Coating ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Thin Film Coating ◽  
Vapor Deposition Process

Chemical Vapor Deposition merupakan metode deposisi yang digunakan untuk menghasilkan bahan padat berkualitas tinggi dan berkinerja tinggi yang biasanya dibawah vakum. Tujuan review ini adalah untuk mengetahui proses dan teknik dari Chemical Vapor Deposition. Prinsip kerja dari Chemical Vapor Deposition yaitu proses pengendapan senyawa/ unsur terjadi akibat reaksi dekomposisi kimia akibat aktivasi termal di seputar komponean yang dilapisi. Beberapa material yang dihasilkan dengan menggunakan metode Chemical Vapor Deposition ini adalah berlian sintesis, thin film coating, lapisan emas dengan ketebalan yang tipis.

Analysis and modeling of residual stress in diamond thin film deposited by the hot-filament chemical vapor deposition process

2001 ◽  
Vol 16 (7) ◽  
pp. 1953-1959
Author(s):  
Seung I. Cha ◽  
Soon H. Hong
Keyword(s):  
Thin Film ◽  
Residual Stress ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Diamond Thin Film ◽  
Hot Filament ◽  
Vapor Deposition Process

The effect of microstructure on residual stress in diamond thin film was investigated. The diamond thin film was deposited by the hot filament chemical vapor deposition process with hydrogen/methane precursor gas and followed by annealing at 1150 °C for 1–30 min. The residual stresses of the diamond thin film were measured by Raman spectroscopy. A model to estimate the residual stress was proposed on the basis of grain boundary relaxation mechanism and microstructural analysis of diamond thin film. It is confirmed that the residual stress in diamond thin film is proportional to a microstructural factor, 1/ [D( f + 1)]1/2, where D is the grain size of diamond and f is the volume ratio of nondiamond carbon/diamond.

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