Efficient n-type doping of Si nanocrystals embedded in SiO2 by ion beam synthesis

2013 ◽  
Vol 102 (1) ◽  
pp. 013116 ◽  
Author(s):  
Rim Khelifi ◽  
Daniel Mathiot ◽  
Raghav Gupta ◽  
Dominique Muller ◽  
Manuel Roussel ◽  
...  
2002 ◽  
Vol 81 (16) ◽  
pp. 3049-3051 ◽  
Author(s):  
Torsten Müller ◽  
Karl-Heinz Heinig ◽  
Wolfhard Möller

2003 ◽  
Vol 83 (1) ◽  
pp. 168-170 ◽  
Author(s):  
P. Normand ◽  
E. Kapetanakis ◽  
P. Dimitrakis ◽  
D. Tsoukalas ◽  
K. Beltsios ◽  
...  

2009 ◽  
Vol 41 (6) ◽  
pp. 1044-1047 ◽  
Author(s):  
Y. Lebour ◽  
D. Navarro-Urrios ◽  
P. Pellegrino ◽  
G. Sarrabayrouse ◽  
L. Pavesi ◽  
...  

2007 ◽  
Vol 997 ◽  
Author(s):  
Vassilis Ioannou-Sougleridis ◽  
Panagiotis Dimitrakis ◽  
Vassilios Em. Vamvakas ◽  
Pascal Normand ◽  
Caroline Bonafos ◽  
...  

AbstractThis work reports on the formation of Si-nanocrystals within silicon nitride layers by low-energy Si ion implantation. Electrical characterization of oxide/Si-nanocrystal-nitride/oxide dielectric stacks demonstrates regions of negative differential resistance at low-fields. In addition, the memory characteristics in terms of charge trapping, write/erase response and retention properties of the dielectric stacks were recorded. The results indicate the large potential of the low-energy ion beam synthesis method in nitride memory technology.


Author(s):  
G Franzò ◽  
E.C Moreira ◽  
D Pacifici ◽  
F Priolo ◽  
F Iacona ◽  
...  

Vacuum ◽  
2005 ◽  
Vol 78 (2-4) ◽  
pp. 519-524 ◽  
Author(s):  
D.I. Tetelbaum ◽  
A.N. Mikhaylov ◽  
O.N. Gorshkov ◽  
A.P. Kasatkin ◽  
A.I. Belov ◽  
...  

2005 ◽  
Vol 49 (11) ◽  
pp. 1734-1744 ◽  
Author(s):  
C. Bonafos ◽  
H. Coffin ◽  
S. Schamm ◽  
N. Cherkashin ◽  
G. Ben Assayag ◽  
...  

2003 ◽  
Vol 775 ◽  
Author(s):  
Suk-Ho Choi ◽  
Jun Sung Bae ◽  
Kyung Jung Kim ◽  
Dae Won Moon

AbstractSi/SiO2 multilayers (MLs) have been prepared under different deposition temperatures (TS) by ion beam sputtering. The annealing at 1200°C leads to the formation of Si nanocrystals in the Si layer of MLs. The high resolution transmission electron microscopy images clearly demonstrate the existence of Si nanocrystals, which exhibit photoluminescence (PL) in the visible range when TS is ≥ 300°C. This is attributed to well-separation of nanocrystals in the higher-TS samples, which is thought to be a major cause for reducing non-radiative recombination in the interface between Si nanocrystal and surface oxide. The visible PL spectra are enhanced in its intensity and are shifted to higher energy by increasing TS. These PL behaviours are consistent with the quantum confinement effect of Si nanocrystals.


2013 ◽  
Author(s):  
Ranjana S. Varma ◽  
D. C. Kothari ◽  
Ravi Kumar ◽  
P. Kumar ◽  
S. S. Santra ◽  
...  

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