scholarly journals First-sharp diffraction peaks in amorphous GeTe and Ge2Sb2Te5 films prepared by vacuum-thermal deposition

AIP Advances ◽  
2012 ◽  
Vol 2 (4) ◽  
pp. 042189 ◽  
Author(s):  
Toshihiro Nakaoka ◽  
Hiroki Satoh ◽  
Saori Honjo ◽  
Hideo Takeuchi
Keyword(s):  
Thermal Deposition ◽  
Diffraction Peaks ◽  
Vacuum Thermal Deposition

Polarization-sensitive photoresponse of the CuSe/Se nanocomposite prepared by vacuum thermal deposition

2019 ◽  
Vol 21 ◽  
pp. 100656 ◽  
Author(s):  
Gennady M. Mikheev ◽  
Vladimir Ya. Kogai ◽  
Konstantin G. Mikheev ◽  
Tatyana N. Mogileva ◽  
Aleksandr S. Saushin ◽  
...  
Keyword(s):  
Thermal Deposition ◽  
Vacuum Thermal Deposition

CuPc nanowires transistors fabricated by vacuum thermal deposition

2017 ◽  
Vol 651 (1) ◽  
pp. 243-249
Author(s):  
Wen Gu ◽  
Xiaoqian Feng ◽  
Bingxing Yang ◽  
Jianhua Zhang
Keyword(s):  
Thermal Deposition ◽  
Vacuum Thermal Deposition

Fractionating vacuum thermal deposition of polyaniline films. Effect of post-deposition acid-base treatment

1994 ◽  
Vol 65 (1) ◽  
pp. 71-76 ◽  
Author(s):  
A.A. Nekrasov ◽  
V.F. Ivanov ◽  
O.L. Gribkova ◽  
A.V. Vannikov
Keyword(s):  
Acid Base ◽  
Thermal Deposition ◽  
Polyaniline Films ◽  
Vacuum Thermal Deposition ◽  
Post Deposition

scholarly journals Synthesis and studying properties of the GNPs@FexOy structure

2021 ◽  
Vol 2086 (1) ◽  
pp. 012132
Author(s):  
P G Bespalova ◽  
A A Vorobyev ◽  
A B Speshilova ◽  
V M Studzinsky ◽  
E A Patirimova ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Iron Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Sample Surface ◽  
Sem Analysis ◽  
Silicon Wafers ◽  
Thermal Deposition ◽  
Natural Oxide ◽  
Vacuum Thermal Deposition

Abstract An article presents a study of the regularities of the formation of gold up to 8 nm thick, deposited by vacuum thermal deposition on silicon wafers with a natural oxide, its annealing and subsequent deposition of iron oxide by chemical vapor deposition. The stages were accompanied by SEM analysis of the sample surface, as well as fixation of the optical and FTIR spectra, I–V characteristics of the obtained structures.

Vacuum-Thermal Deposition of Semiconductors

2019 ◽  
pp. 37-49
Author(s):  
Rishat G. Valeev ◽  
Alexander V. Vakhrushev ◽  
Aleksey Yu. Fedotov ◽  
Dmitrii I. Petukhov
Keyword(s):  
Thermal Deposition ◽  
Vacuum Thermal Deposition

Luminescent Diiridium Complexes with Bridging Pyrazolates: Characterization and Fabrication of OLEDs Using Vacuum Thermal Deposition

2018 ◽  
Vol 6 (11) ◽  
pp. 1800083 ◽  
Author(s):  
Jia-Ling Liao ◽  
Palanisamy Rajakannu ◽  
Premkumar Gnanasekaran ◽  
Shang-Ru Tsai ◽  
Chun-Han Lin ◽  
...  
Keyword(s):  
Thermal Deposition ◽  
Vacuum Thermal Deposition

Reverse Engineering of Thin Films to Nanoparticles by Thermal Deposition for Large-Scale Production of Nanometals

2020 ◽  
Vol 61 ◽  
pp. 42-50
Author(s):  
Karthik Paneer Selvam ◽  
Zaw Lin ◽  
Inoue Hirotaka ◽  
Marui Tatsuki ◽  
Takeshi Nishikawa ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Reverse Engineering ◽  
High Vacuum ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Scale Production ◽  
Simple Method ◽  
Thermal Deposition ◽  
Vacuum Thermal Deposition

A simple method to synthesize metal nanoparticles (Nps) has been proposed using high vacuum thermal deposition (HVTD) by reverse engineering of thin films to Nps. Metal Nps synthesized by this technique corresponds to the top-down approach of nanomaterial synthesis from bulk metals of silver and copper wires to metal Nps. A high-vacuum thermal deposition is a commonly used technique for thin-film deposition in many applications. Synthesis of metal Nps by HVTD is simple, efficient, and can provide particle of about few tens of nanometers is effortless. A precoated thin layer of polyethylene glycol (PEG) on a glass substrate (Petri dish), is allowed deposit with a metallic thin film by thermionically evaporating bulk metal wires in high vacuum. The deposited metal thin film is removed along with the PEG coating into a liquid medium and subjected to sonication, stirring, and deoxidation. Obtaining the particle size in tens of nanometer range in one step is one projecting factor by HVTD technique. Also, providing the feasibility of reusing large particles as precursors after synthesis is a unique vantage point. The Nps were analyzed by various characterizations tools to evaluate the underlying properties.

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