Transient gas flow studied by a test particle Monte Carlo approach with ProVac3D

2012 ◽  
Author(s):  
Xueli Luo ◽  
Thomas Giegerich ◽  
Christian Day
Keyword(s):  
Monte Carlo ◽  
Test Particle ◽  
Gas Flow ◽  
Monte Carlo Approach

Wigner-Boltzmann Monte Carlo approach to nanodevice simulation: from quantum to semiclassical transport

2009 ◽  
Vol 8 (3-4) ◽  
pp. 324-335 ◽  
Author(s):  
Damien Querlioz ◽  
Huu-Nha Nguyen ◽  
Jérôme Saint-Martin ◽  
Arnaud Bournel ◽  
Sylvie Galdin-Retailleau ◽  
...  
Keyword(s):  
Monte Carlo ◽  
Monte Carlo Approach ◽  
Semiclassical Transport

Study on the Deposition Profile Characteristics in the Micron-Scale Trench Using Direct Simulation Monte Carlo Method

1998 ◽  
Vol 120 (2) ◽  
pp. 296-302 ◽  
Author(s):  
Masato Ikegawa ◽  
Jun’ichi Kobayashi ◽  
Morihisa Maruko
Keyword(s):  
Monte Carlo ◽  
Monte Carlo Method ◽  
Boundary Conditions ◽  
Gas Flow ◽  
Direct Simulation Monte Carlo ◽  
Low Pressure ◽  
Sputter Deposition ◽  
Direct Simulation ◽  
Simulation Monte Carlo ◽  
Profile Characteristics

As integrated circuits are advancing toward smaller device features, step-coverage in submicron trenches and holes in thin film deposition are becoming of concern. Deposition consists of gas flow in the vapor phase and film growth in the solid phase. A deposition profile simulator using the direct simulation Monte Carlo method has been developed to investigate deposition profile characteristics on small trenches which have nearly the same dimension as the mean free path of molecules. This simulator can be applied to several deposition processes such as sputter deposition, and atmospheric- or low-pressure chemical vapor deposition. In the case of low-pressure processes such as sputter deposition, upstream boundary conditions of the trenches can be calculated by means of rarefied gas flow analysis in the reactor. The effects of upstream boundary conditions, molecular collisions, sticking coefficients, and surface migration on deposition profiles in the trenches were clarified.

scholarly journals On the stochastic uncertainties of thermally and optically stimulated luminescence signals: A Monte Carlo approach

2020 ◽  
Vol 219 ◽  
pp. 116945
Author(s):  
Vasilis Pagonis ◽  
Sebastian Kreutzer ◽  
Alex Roy Duncan ◽  
Ena Rajovic ◽  
Christian Laag ◽  
...  
Keyword(s):  
Monte Carlo ◽  
Optically Stimulated Luminescence ◽  
Monte Carlo Approach ◽  
Stochastic Uncertainties
Sign in / Sign up

Export Citation Format

Share Document