Low-frequency noise in gallium nitride nanowire mechanical resonators

2012 ◽  
Vol 101 (23) ◽  
pp. 233115 ◽  
Author(s):  
Jason M. Gray ◽  
Kris A. Bertness ◽  
Norman A. Sanford ◽  
Charles T. Rogers
2000 ◽  
Vol 618 ◽  
Author(s):  
C.F. Zhu ◽  
W.K. Fong ◽  
B.H. Leung ◽  
C.C. Cheng ◽  
C. Surya ◽  
...  

ABSTRACTGallium nitride films were grown by rf-plasma assisted molecular beam epitaxy. A small indium flux was used as surfactant during the growth. The optical and electrical properties of the films grown with and without In surfactant were characterized by investigating the photoluminescence (PL), high resolution x-ray diffraction (HRXRD) and low-frequency noise power spectra. The sample grown in the presence of In surfactant showed a suppressed yellow luminescence (YL) compared to the one grown without In surfactant. Significant reduction in the full width at half maximum of the GaN (0002) x-ray diffraction peak, indicating a better film quality, was obtained when In surfactant was used during growth. Atomic force microscopy studies show that the root mean squared surface roughness for films grown with and without the In surfactant are 5.86 and 6.99 nm respectively indicating significant improvement in surface morphology. This is attributed to the enhanced 2-dimensional growth by In surfactant. A smaller Hooge parameter was obtained from the low-frequency noise measurement for the sample grown with In surfactant indicating that application of In surfactant led to significant reduction in the trap density of the material.


Author(s):  
SERGEY L. RUMYANTSEV ◽  
MICHAEL S. SHUR ◽  
REMIS GASKA ◽  
MICHAEL. E. LEVINSHTEIN ◽  
M. ASIF KHAN ◽  
...  

2004 ◽  
Vol 38 (9) ◽  
pp. 998-1000
Author(s):  
N. M. Shmidt ◽  
M. E. Levinshtein ◽  
W. V. Lundin ◽  
A. I. Besyul’kin ◽  
P. S. Kop’ev ◽  
...  

1998 ◽  
Vol 512 ◽  
Author(s):  
N. Dyakonova ◽  
M. Levinshtein ◽  
S. Contreras ◽  
W. Knap ◽  
B. Beaumont ◽  
...  

ABSTRACTLow frequency noise has been investigated in hexagonal n-type GaN with equilibrium electron concentration n ∼ 1017 cm−3 at T=300 K. The frequency and temperature dependencies of the spectral density of the current noise, SI, have been studied in the frequency range f from 20 Hz to 20 kHz. Over the whole temperature range from T=80K to 400K the SI(f) dependence is very close to 1/f. The value of the Hooge constant, α, is very large: α ∼ 5 – 7 and is found to be temperature independent. The effects of illumination on the low frequency noise in GaN are studied for the first time. The noise is unaffected by illumination with photon energy Eph < Eg, while band-to band illumination (Eph∼Eg ) influences the low frequency noise, increasing the noise at higher temperatures, and decreasing it at lower temperatures.


Vestnik MEI ◽  
2018 ◽  
Vol 5 (5) ◽  
pp. 120-127
Author(s):  
Mikhail D. Vorobyev ◽  
◽  
Dmitriy N. Yudaev ◽  
Andrey Yu. Zorin ◽  
◽  
...  

1999 ◽  
Author(s):  
Charles K. Birdsall ◽  
J. P. Varboncoeur ◽  
P. J. Christensen

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