Microstructural and ferromagnetic resonance properties of epitaxial nickel ferrite films grown by chemical vapor deposition

2012 ◽  
Vol 101 (13) ◽  
pp. 132409 ◽  
Author(s):  
N. Li ◽  
S. Schäfer ◽  
R. Datta ◽  
T. Mewes ◽  
T. M. Klein ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Ferromagnetic Resonance ◽  
Vapor Deposition ◽  
Nickel Ferrite ◽  
Chemical Vapor ◽  
Resonance Properties ◽  
Ferrite Films

Chemical Vapor Deposition of Nickel Ferrite Using Ni C5H5 2 and Fe C5H4C4H9 C5H5

2010 ◽  
Vol 3 (1) ◽  
Author(s):  
Rachel Walker ◽  
M. Singh ◽  
Y. Yang ◽  
C.G. Takoudis
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Nickel Ferrite ◽  
Chemical Vapor ◽  
Silicon Substrates ◽  
Pressure Chemical ◽  
Oxygen Gas ◽  
The Individual

Chemical vapor deposition was used to deposit thin films of nickel oxide (NiO) and iron oxide (Fe2O3) on silicon substrates. Precursors chosen for this process were nickelocene,Ni(C5H5)2 and n-butylferrocene, Fe(C5H4C4H9)(C5H5), which were oxidized with oxygen gas in a low-pressure chemical vapor deposition system. Following the deposition of the individual metal oxides, the two precursors were used together with the goal of depositing a thin film of nickel ferrite (NiFe2O4). Both co-deposition and cyclic deposition were carried out, and the resulting thin films were analyzed using x-ray photoelectron spectroscopy. This study found that the resulting thin films did not contain NiFe2O4, but were composed of NiO and Fe2O3 in a different ratio. It is suggested that changing various parameters in this experiment can be used to vary this ratio.

Ultra-narrow ferromagnetic resonance in organic-based thin films grown via low temperature chemical vapor deposition

2014 ◽  
Vol 105 (1) ◽  
pp. 012407 ◽  
Author(s):  
H. Yu ◽  
M. Harberts ◽  
R. Adur ◽  
Y. Lu ◽  
P. Chris Hammel ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Ferromagnetic Resonance ◽  
Vapor Deposition ◽  
Chemical Vapor

scholarly journals Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties

2021 ◽  
pp. 2100949
Author(s):  
Dennis Zywitzki ◽  
Raoul Schaper ◽  
Engin Ciftyürek ◽  
Jan‐Lucas Wree ◽  
Dereje H. Taffa ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Nickel Ferrite ◽  
Chemical Vapor ◽  
Ferrite Thin Films ◽  
Cobalt And Nickel

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

Sign in / Sign up

Export Citation Format

Share Document