Repeatable low-temperature negative-differential resistance from Al0.18Ga0.82N/GaN resonant tunneling diodes grown by molecular-beam epitaxy on free-standing GaN substrates

2012 ◽  
Vol 100 (25) ◽  
pp. 252105 ◽  
Author(s):  
D. Li ◽  
L. Tang ◽  
C. Edmunds ◽  
J. Shao ◽  
G. Gardner ◽  
...  
1999 ◽  
Vol 38 (Part 2, No. 8B) ◽  
pp. L920-L922 ◽  
Author(s):  
Masafumi Tsutsui ◽  
Masahiro Watanabe ◽  
Masahiro Asada

1996 ◽  
Vol 448 ◽  
Author(s):  
Akira Izumi ◽  
Noriyuki Matsubara ◽  
Yusuke Kushida ◽  
Kazuo Tsutsui ◽  
Nikolai S. Sokolov

AbstractWe proposed use of a new CdF2/CaF2 heterointerface for the formation of large conduction band discontinuities to apply quantum effect devices fabricated on Si substrates. Resonant tunneling diodes using this heterointerface on Si were fabricated and negative differential resistance whose P/V current ratio of 24 at highest was observed at room temperature.


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