scholarly journals Solid-phase crystallization of ultra high growth rate amorphous silicon films

2012 ◽  
Vol 111 (10) ◽  
pp. 103510 ◽  
Author(s):  
K. Sharma ◽  
M. V. Ponomarev ◽  
M. A. Verheijen ◽  
O. Kunz ◽  
F. D. Tichelaar ◽  
...  
1998 ◽  
Vol 135 (1-4) ◽  
pp. 205-208 ◽  
Author(s):  
Yongqian Wang ◽  
Xianbo Liao ◽  
Zhixun Ma ◽  
Guozhen Yue ◽  
Hongwei Diao ◽  
...  

Author(s):  
Curtis Anderson ◽  
Lin Cui ◽  
Uwe Kortshagen

This paper describes the rapid formation of polycrystalline silicon films through seeding with silicon nanocrystals. The incorporation of seed crystals into amorphous silicon films helps to eliminate the crystallization incubation time observed in non-seeded amorphous silicon films. Furthermore, the formation of several tens of nanometer in diameter voids is observed when cubic silicon nanocrystals with around 30 nm in size are embedded in the amorphous films. These voids move through the amorphous film with high velocity, pulling behind them a crystallized “tail.” This mechanism leads to rapid formation of polycrystalline films.


1977 ◽  
Vol 16 (S1) ◽  
pp. 547 ◽  
Author(s):  
Yoshihiro Imamura ◽  
Katsuhiko Daido ◽  
Kazushige Mimegishi ◽  
Hideo Nakanishi

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