Surface chemical reactions studied via ab initio‐derived molecular dynamics simulations: Fluorine etching of Si(100)

1993 ◽  
Vol 98 (1) ◽  
pp. 737-745 ◽  
Author(s):  
Paul C. Weakliem ◽  
Emily A. Carter
2014 ◽  
Vol 16 (21) ◽  
pp. 9760-9775 ◽  
Author(s):  
R. B. Gerber ◽  
D. Shemesh ◽  
M. E. Varner ◽  
J. Kalinowski ◽  
B. Hirshberg

Recent progress in “on-the-fly” trajectory simulations of molecular reactions, using different electronic structure methods is discussed, with analysis of the insights that such calculations can provide and of the strengths and limitations of the algorithms available.


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