Investigation of CO photolysis at 193 nm using oxygen‐atom two‐photon laser‐induced fluorescence near 225.6 nm

1990 ◽  
Vol 93 (7) ◽  
pp. 4791-4795 ◽  
Author(s):  
Clifton N. Merrow ◽  
Brad E. Forch
Keyword(s):  
Oxygen Atom ◽  
Laser Induced Fluorescence ◽  
Two Photon ◽  
193 Nm

Anisotropy and energy disposal in the 193-nm nitrous oxide photodissociation measured by VUV laser-induced fluorescence of oxygen atom (1D)

1993 ◽  
Vol 97 (28) ◽  
pp. 7239-7241 ◽  
Author(s):  
L. L. Springsteen ◽  
S. Satyapal ◽  
Y. Matsumi ◽  
L. M. Dobeck ◽  
P. L. Houston
Keyword(s):  
Nitrous Oxide ◽  
Oxygen Atom ◽  
Laser Induced Fluorescence ◽  
193 Nm

Imaging hydrogen flames by two-photon, laser-induced fluorescence

1991 ◽  
Author(s):  
R. MILES ◽  
W. LEMPERT ◽  
V. KUMAR ◽  
G. DISKIN
Keyword(s):  
Laser Induced Fluorescence ◽  
Two Photon

scholarly journals Progresses on the Use of Two-Photon Absorption Laser Induced Fluorescence (TALIF) Diagnostics for Measuring Absolute Atomic Densities in Plasmas and Flames

Plasma ◽  
2021 ◽  
Vol 4 (1) ◽  
pp. 145-171
Author(s):  
Kristaq Gazeli ◽  
Guillaume Lombardi ◽  
Xavier Aubert ◽  
Corinne Y. Duluard ◽  
Swaminathan Prasanna ◽  
...  
Keyword(s):  
Optical Transition ◽  
Thin Film Deposition ◽  
Laser Induced Fluorescence ◽  
Film Deposition ◽  
Stimulated Emission ◽  
Photon Absorption ◽  
Collisional Quenching ◽  
Two Photon Absorption ◽  
Two Photon ◽  
Wide Range

Recent developments in plasma science and technology have opened new areas of research both for fundamental purposes (e.g., description of key physical phenomena involved in laboratory plasmas) and novel applications (material synthesis, microelectronics, thin film deposition, biomedicine, environment, flow control, to name a few). With the increasing availability of advanced optical diagnostics (fast framing imaging, gas flow visualization, emission/absorption spectroscopy, etc.), a better understanding of the physicochemical processes taking place in different electrical discharges has been achieved. In this direction, the implementation of fast (ns) and ultrafast (ps and fs) lasers has been essential for the precise determination of the electron density and temperature, the axial and radial gradients of electric fields, the gas temperature, and the absolute density of ground-state reactive atoms and molecules in non-equilibrium plasmas. For those species, the use of laser-based spectroscopy has led to their in situ quantification with high temporal and spatial resolution, with excellent sensitivity. The present review is dedicated to the advances of two-photon absorption laser induced fluorescence (TALIF) techniques for the measurement of reactive species densities (particularly atoms such as N, H and O) in a wide range of pressures in plasmas and flames. The requirements for the appropriate implementation of TALIF techniques as well as their fundamental principles are presented based on representative published works. The limitations on the density determination imposed by different factors are also discussed. These may refer to the increasing pressure of the probed medium (leading to a significant collisional quenching of excited states), and other issues originating in the high instantaneous power density of the lasers used (such as photodissociation, amplified stimulated emission, and photoionization, resulting to the saturation of the optical transition of interest).

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