Concentration dependence of the self‐diffusion coefficient of hard, spherical particles measured with photon correlation spectroscopy

1982 ◽  
Vol 77 (12) ◽  
pp. 5913-5922 ◽  
Author(s):  
M. M. Kops‐Werkhoven ◽  
C. Pathmamanoharan ◽  
A. Vrij ◽  
H. M. Fijnaut
Keyword(s):  
Diffusion Coefficient ◽  
Concentration Dependence ◽  
Photon Correlation Spectroscopy ◽  
Correlation Spectroscopy ◽  
The Self ◽  
Spherical Particles ◽  
Photon Correlation ◽  
Self Diffusion ◽  
Self Diffusion Coefficient

A Nonequilibrium Approach for Self-Diffusion in Unbounded Rapid Granular Flows

2000 ◽  
Vol 627 ◽  
Author(s):  
Payman Jalali ◽  
Piroz Zamankhan ◽  
William Polashenski
Keyword(s):  
Diffusion Coefficient ◽  
Kinetic Theory ◽  
Diffusion Problem ◽  
The Self ◽  
Spherical Particles ◽  
Self Diffusion ◽  
Granular Shear ◽  
Simulation Results ◽  
Self Diffusion Coefficient ◽  
Simulation Scheme

ABSTRACTA nonequilibrium simulation scheme is introduced to investigate the transverse diffusive motion in unbounded shear flows of smooth, monodisperse, inelastic spherical particles. A certain labeling algorithm is used in this scheme to extract a one-way particle mass flux which results a concentration gradient for the labeled particles. The self-diffusion coefficient can then be obtained from Fick's law. Using this scheme, one may find that the self-diffusion phenomenon across any layer inside the granular shear flow is analogous to the classic diffusion problem across a membrane. Under steady conditions, the current simulation results revealed that the particle diffusivity can be described by a linear law. This finding justifies the assumption of a linear law relationship in the kinetic theory type derivation of an expression for self-diffusivity. Moreover, it is shown that the results of self-diffusion coefficient obtained from the computer simulations are in agreement with the predictions of kinetic theory formulations in the range of solid volume fractions less than 0.5.

Investigation on the Diffusion Behavior of Mo-Ni Interface

2010 ◽  
Vol 152-153 ◽  
pp. 1607-1610 ◽  
Author(s):  
Wei Chan Cao ◽  
Shu Hua Liang ◽  
Yue Xin Xue ◽  
Xian Hui Wang
Keyword(s):  
Solid Solution ◽  
Diffusion Coefficient ◽  
Electron Microscope ◽  
Intermetallic Compound ◽  
Diffusion Layer ◽  
Interdiffusion Coefficient ◽  
The Self ◽  
Diffusion Behavior ◽  
Self Diffusion ◽  
Self Diffusion Coefficient

In order to gain a deep insight into the mechanism of Ni-doped Mo activated sintering process, the diffusion behavior of Mo-Ni interface was studied utilizing a Mo-Ni diffusion couple. The phase structure and composition on the diffusion layer were characterized and analyzed by means of scanning electron microscope and transmission electron microscope, the self diffusion coefficient and interdiffusion coefficient were calculated. The results show that a diffusion layer is formed between Mo and Ni after sintering at 1223k for 1h, which is comprised of a δ-NiMo intermetallic compound and a limit solid solution containing small amounts of nickel. The self diffusion coefficient and interdiffusion coefficient are 2.068×10-18cm2/s and 4.5×10-12cm2/s, respectively. It is suggested that the diffusion rate of Mo in δ-NiMo intermetallic compound and a limit solid solution containing small amounts of nickel is 106 times bigger than that of self diffusion, and the intermetallic compound layer provides a short diffusion path for Mo activated sintering.

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