Quantum yields for the production of O(1S), N(2D), and N2(A 3Σ+u) from the vacuum uv photolysis of N2O

1975 ◽  
Vol 62 (11) ◽  
pp. 4266-4273 ◽  
Author(s):  
G. Black ◽  
R. L. Sharpless ◽  
T. G. Slanger ◽  
D. C. Lorents
Keyword(s):  
Quantum Yields ◽  
Uv Photolysis ◽  
Vacuum Uv

scholarly journals Degradation and transformation of natural organic matter accountable for disinfection byproduct formations by UV photolysis and UV/chlor(am)ine

2018 ◽  
Vol 79 (5) ◽  
pp. 929-937 ◽  
Author(s):  
Chanathip Hirun-Utok ◽  
Songkeart Phattarapattamawong
Keyword(s):  
Organic Matter ◽  
Natural Organic Matter ◽  
Low Pressure ◽  
Haloacetic Acid ◽  
Uv Photolysis ◽  
Disinfection Byproduct ◽  
Proportional Relationship ◽  
Vacuum Uv ◽  
Potential Use

Abstract This research aimed to investigate the degradation of natural organic matter responsible for the formation of trihalomethane (THM), haloacetic acid (HAA) and haloacetonitrile (HAN) during ultraviolet (UV) photolysis and a co-exposure of UV with chlorine (UV/chlorine) and chloramine (UV/chloramine). Low pressure UV (LPUV) and vacuum UV (VUV) lamps were used for photolysis. VUV and LPUV irradiation changed aromatic/unsaturated structures to aliphatic ones, resulting in decreased THM and HAN formation. Following irradiation for 60 min, LPUV decreased THM and HAN by 16% ± 2% and 20% ± 6%, respectively. VUV decreased THM and HAN formation by 23% ± 3% and 20% ± 8%, respectively. HAA formation increased following photolysis. UV/chlorine treatment decreased THM, HAA and HAN. Higher chlorine doses had an inversely proportional relationship with THM and HAN formation. A chlorine dose of 4 mg·L−1 led to the greatest reductions, corresponding to 42% ± 2%, 10% ± 10% and 18% ± 6% for THM, HAA and HAN, respectively. UV/chloramine decreased the formation of THM more than UV/chlorine. With a chloramine dose of 4 mg·L−1, THM, HAA and HAN formation decreased by 74% ± 10%, 10% ± 10% and 11% ± 10%, respectively. This study showed the potential use of UV/chlor(am)ine for controlling the formation of THM, HAA and HAN.

Vacuum UV photolysis of n-1-hexene and 4-methyl-1-pentene

1980 ◽  
Vol 12 (3) ◽  
pp. 249-261 ◽  
Author(s):  
Hélène Deslauriers ◽  
Guy J. Collin
Keyword(s):  
Uv Photolysis ◽  
Vacuum Uv

scholarly journals Photoinduced Transformation of Carbon Monoxide in Aqueous Solution

1988 ◽  
Vol 43 (5) ◽  
pp. 430-434
Author(s):  
Hyoung Ryun Park ◽  
Nikola Getoff
Keyword(s):  
Aqueous Solution ◽  
Carbon Monoxide ◽  
Product Formation ◽  
Quantum Yields ◽  
Ph Values ◽  
Probable Reaction Mechanism ◽  
Probable Reaction ◽  
Photoinduced Transformation ◽  
Vacuum Uv Radiation ◽  
Vacuum Uv

Abstract The photoinduced conversion of CO in aqueous solution under the influence of vacuum-uv radiation at λ = 185 nm has been investigated at pH values ranging from 2 to 13. Formaldehyde, glyoxal, carboxylic acids and small amounts of glycol were determined as final products. Initial quantum yields for product formation have been determined. A probable reaction mechanism is presented.

Vacuum uv photolysis of N2O

1974 ◽  
Vol 61 (7) ◽  
pp. 2857-2859 ◽  
Author(s):  
M. J. McEwan ◽  
G. M. Lawrence ◽  
H. M. Poland
Keyword(s):  
Uv Photolysis ◽  
Vacuum Uv

The vacuum UV photolysis of 1-butyne

1981 ◽  
Vol 17 (1) ◽  
pp. 32-33
Author(s):  
G.J. Collin
Keyword(s):  
Uv Photolysis ◽  
Vacuum Uv

Rare‐Gas‐Sensitized Vacuum uv Photolysis of Some Aliphatic Hydrocarbons

1966 ◽  
Vol 44 (1) ◽  
pp. 420-422 ◽  
Author(s):  
Günther von Bünau ◽  
Ralph N. Schindler
Keyword(s):  
Aliphatic Hydrocarbons ◽  
Rare Gas ◽  
Uv Photolysis ◽  
Vacuum Uv
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