Dependence of the saturation behaviour of the metastable defect creation on a-Si:H material properties measured by keV electron irradiation

1991 ◽  
Author(s):  
A. Scholz ◽  
B. Schröder
Keyword(s):  
Electron Irradiation ◽  
Material Properties ◽  
Defect Creation ◽  
Metastable Defect

A Quantitative Model for the Metastable Defect Creation in Amorphous Semiconductors by Kev-Electron Irradiation

1994 ◽  
Vol 336 ◽  
Author(s):  
A. Scholz ◽  
B. Schröder ◽  
H. Oechsner
Keyword(s):  
Energy Dissipation ◽  
Electron Irradiation ◽  
Quantitative Agreement ◽  
Quantitative Model ◽  
Amorphous Semiconductor ◽  
Amorphous Semiconductors ◽  
Experimental Results ◽  
Defect Creation ◽  
Hydrogenated Amorphous ◽  
Metastable Defect

ABSTRACTThe interaction mechanisms of keV-electrons with the hydrogenated Amorphous semiconductor are briefly discussed and the differences to the metastable defect creation by photons are set out. Based on the knowlegde of the energy dissipation mechanisms of keV-electrons in the hydrogenated Amorphous semiconductor, a model for the creation of metastable defects by keV-electron irradiation is developed and its quantitative agreement with the experimental results is shown.

Comparison of Current and Light Induced Defects in a-Si:H

1993 ◽  
Vol 297 ◽  
Author(s):  
R.A. Street ◽  
W.B. Jackson ◽  
M. Hack
Keyword(s):  
Numerical Modelling ◽  
Reverse Bias ◽  
Defect Density ◽  
Reverse Current ◽  
Bias Current ◽  
Spatial Profile ◽  
Forward Current ◽  
Defect Creation ◽  
Induced Defects ◽  
Metastable Defect

Metastable defect creation by illumination and by a forward current in p-i-n devices are compared using CPM and reverse current measurements of the defect density. The data show that the same defects are formed by the two mechanisms, but with different spatial profiles. Numerical modelling shows how the spatial profile influences the reverse bias current.

Tailoring the material properties of gelatin hydrogels by high energy electron irradiation

2014 ◽  
Vol 2 (27) ◽  
pp. 4297-4309 ◽  
Author(s):  
Emilia I. Wisotzki ◽  
Marcel Hennes ◽  
Carsten Schuldt ◽  
Florian Engert ◽  
Wolfgang Knolle ◽  
...  
Keyword(s):  
Electron Irradiation ◽  
Material Properties ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron

Pulsed-Light-Induced Metastable Defect Creation in Hydrogenated Amorphous Silicon

1995 ◽  
Vol 377 ◽  
Author(s):  
Jong-Hwan Yoon ◽  
H. L. Kim
Keyword(s):  
Time Dependence ◽  
Amorphous Silicon ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Pulsed Light ◽  
Illumination Time ◽  
Defect Creation ◽  
Annealing Rate ◽  
Hydrogenated Amorphous ◽  
Metastable Defect

ABSTRACTWe report the results of a study of metastable defect creation by pulsed light soaking in undoped hydrogenated amorphous silicon (a-Si:H). An illumination time dependence of the defect density, a saturated defect density, and light-induced annealing under pulsed laser light have been studied. Measurements show approximately a t1/2 time-dependence of the defect creation, which is independent of light intensity. It is observed that the saturation value of the defect density is about one order of magnitude higher than by cw illumination in device quality films. It has been suggested that these results would be due to the difference in the light-induced defect annealing rate between cw and pulsed lights, in which it is found that the light-induced annealing rate by pulsed light is lower than by cw light.

Defect creation by 10‐keV electron irradiation in phosphorous‐dopeda‐Si:H

1990 ◽  
Vol 67 (6) ◽  
pp. 2800-2805 ◽  
Author(s):  
Suvarna Babras ◽  
V. G. Bhide ◽  
N. R. Rajopadhye ◽  
S. V. Bhoraskar
Keyword(s):  
Electron Irradiation ◽  
Defect Creation

Relaxation of Electron Beam-Induced Metastable Defects in a-Si:II

1993 ◽  
Vol 297 ◽  
Author(s):  
M. Grimbergen ◽  
R. Mcconville ◽  
D. Redfield ◽  
R.H. Bube
Keyword(s):  
Activation Energy ◽  
Electron Beam ◽  
Amorphous Silicon ◽  
Time Constant ◽  
Electron Irradiation ◽  
Defect Density ◽  
Initial Density ◽  
Induced Defects ◽  
Metastable Defect

Relaxation of the metastable defect density in undoped amorphous silicon is observed after keV electron irradiation. The time constant for relaxation has an activation energy close to 1 eV, similar to that for light-induced defects. Relaxation appears to follow two or more stages. A large initial density relaxes rapidly, followed by slower relaxation more characteristic of light-induced defects. Separation of these components allows for a better comparison of e-beam and light-induced saturation defect density.

Sign in / Sign up

Export Citation Format

Share Document