Effect of Fe-exchange-field penetration on the residual amorphous phase in nanocrystalline Fe92Zr8

2000 ◽  
Vol 87 (9) ◽  
pp. 7097-7099 ◽  
Author(s):  
K. Suzuki ◽  
J. M. Cadogan
1999 ◽  
Vol 11 (17) ◽  
pp. L179-L185 ◽  
Author(s):  
D Kaptás ◽  
T Kemény ◽  
J Balogh ◽  
L Bujdosó ◽  
L F Kiss ◽  
...  

1999 ◽  
Vol 8 (6) ◽  
pp. 455-462 ◽  
Author(s):  
Lin De-ming ◽  
Wang Hua-sheng ◽  
Wu Yi-chu ◽  
Lin Mu-liang

2009 ◽  
Vol 409 ◽  
pp. 373-376
Author(s):  
Kornel Csach ◽  
Jozef Miškuf ◽  
Alena Juríková ◽  
Václav Ocelík

The application of FINEMET-type materials with specific magnetic properties prepared by the crystallization of amorphous alloys is often limited by their brittleness. The structure of these materials consists of nanosized Fe-based grains surrounded with amorphous phase. Then the final macroscopic mechanical properties are considerably influenced by the properties of this amorphous phase. Direct creep measurements during the crystallization of FINEMET alloys were performed and the creep properties of the residual amorphous phase formed during the nanocrystallization were described. It was shown that due to relatively high temperatures the residual amorphous phase undergoes intensive structural relaxation resulting in the obvious embrittlement of these materials.


2008 ◽  
Vol 389-390 ◽  
pp. 504-509
Author(s):  
A.Q. Biddut ◽  
Liang Chi Zhang ◽  
Y.M. Ali ◽  
Zong Wen Liu

This paper experimentally investigates the micro-structural changes in mono-crystalline silicon induced by abrasive polishing with abrasive grain size and applied pressure. It was found that while the large abrasives of about 15 μm and 300 nm in diameter induce both residual amorphous phase and various residual crystalline structures and dislocations, the finer abrasives of about 50 nm in diameter only produce residual amorphous phase in the top subsurface of polished silicon. With the fine abrasives, reducing applied pressure reduces the amorphous layer thickness, and a damage-free polishing can be achieved at the pressure of 20 kPa.


2006 ◽  
Vol 114 (1330) ◽  
pp. 575-579
Author(s):  
Satoru ISHIHARA ◽  
Joachim BILL ◽  
Fritz ALDINGER ◽  
Yutaka SHINODA ◽  
Fumihiro WAKAI ◽  
...  

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