Preparation and properties of lead-zirconate-titanate ferroelectric thin films using radio frequency planar magnetron sputtering

2000 ◽  
Vol 87 (8) ◽  
pp. 3931-3936 ◽  
Author(s):  
C. C. Chang ◽  
C. S. Tang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Lead Zirconate Titanate ◽  
Lead Zirconate ◽  
Ferroelectric Thin Films ◽  
Zirconate Titanate ◽  
Planar Magnetron

The influence of niobium-doping on lead zirconate titanate ferroelectric thin films

1991 ◽  
Vol 69 (3-4) ◽  
pp. 260-264 ◽  
Author(s):  
E. M. Griswold ◽  
M. Sayer ◽  
D. T. Amm ◽  
I. D. Calder
Keyword(s):  
Thin Films ◽  
Lead Zirconate Titanate ◽  
Ferroelectric Properties ◽  
Lead Zirconate ◽  
Ferroelectric Thin Films ◽  
Crystallographic Structure ◽  
Niobium Content ◽  
Processing Technologies ◽  
Niobium Doping ◽  
Zirconate Titanate

Ferroelectric thin films have recently proven viable for nonvolatile memory applications in semiconductor technology. Current research is focused on the development of processing technologies and deposition on metallized semiconductor substrates. In this study, niobium-doped lead zirconate titanate thin films were prepared by a dc magnetron-sputtering technique using a multielement metal target. Films were deposited on indium tin oxide coated glass and on metallizations on silicon substrates. The crystallographic structure and surface morphology of the films was examined by scanning electron microscopy and X-ray diffraction as a function of processing variables such as sputtering pressure, film thickness, and niobium content. Electrical characterization of the films is discussed in terms of ferroelectric hysteresis and polarization properties. Improved ferroelectric properties are achieved through a densified structure resulting from niobium-doping.

Scaling and disorder analysis of localI–Vcurves from ferroelectric thin films of lead zirconate titanate

2011 ◽  
Vol 22 (25) ◽  
pp. 254031 ◽  
Author(s):  
Peter Maksymovych ◽  
Minghu Pan ◽  
Pu Yu ◽  
Ramamoorthy Ramesh ◽  
Arthur P Baddorf ◽  
...  
Keyword(s):  
Thin Films ◽  
Lead Zirconate Titanate ◽  
Lead Zirconate ◽  
Ferroelectric Thin Films ◽  
Zirconate Titanate

Orientation Dependence of Strontium-doped Lead Zirconate Titanate (PSZT) Thin Films on RF Magnetron Sputtering Conditions

2006 ◽  
Vol 928 ◽  
Author(s):  
Sharath Sriram ◽  
Madhu Bhaskaran ◽  
Anthony Stephen Holland ◽  
Geoffrey K Reeves
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Cooling Rate ◽  
Lead Zirconate Titanate ◽  
Ferroelectric Properties ◽  
Rf Magnetron Sputtering ◽  
Lead Zirconate ◽  
Orientation Dependence ◽  
Grain Structure ◽  
Zirconate Titanate

ABSTRACTStudies on strontium-doped lead zirconate titanate (PSZT) have been reported for its high piezoelectric and ferroelectric properties. For PSZT to exhibit pronounced piezoelectric behaviour it must have a crystalline grain structure (perovskite orientation). This paper is a study of the deposition of PSZT thin films by RF magnetron sputtering and the effect of cooling rate, after deposition at temperatures between 500 °C and 700 °C. X-Ray Diffraction (XRD) results are used to show how a cooling rate of 5 °C/min increases the degree of perovskite orientation in sputtered films, when compared to a cooling rate of 15 °C/min. The absence of significant shifts in the positions of diffraction peak patterns in XRD results are used to demonstrate low stress in the deposited films. Atomic Force Microscope (AFM) imaging is used to show the crystalline nature of the PSZT thin films.

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