Investigation of the band offsets caused by thin Al2O3 layers in HfO2 based Si metal oxide semiconductor devices

2012 ◽  
Vol 100 (6) ◽  
pp. 062907 ◽  
Author(s):  
Lior Kornblum ◽  
Boris Meyler ◽  
Catherine Cytermann ◽  
Svetlana Yofis ◽  
Joseph Salzman ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Semiconductor Devices ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Band Offsets

Interface state‐induced shift of the oxide and semiconductor core levels for metal–oxide–semiconductor devices

1996 ◽  
Vol 80 (3) ◽  
pp. 1578-1582 ◽  
Author(s):  
H. Kobayashi ◽  
K. Namba ◽  
Y. Yamashita ◽  
Y. Nakato ◽  
T. Komeda ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Semiconductor Devices ◽  
Interface State ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor
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