scholarly journals Observation and simulation of hard x ray photoelectron diffraction to determine polarity of polycrystalline zinc oxide films with rotation domains

2012 ◽  
Vol 111 (3) ◽  
pp. 033525 ◽  
Author(s):  
Jesse R. Williams ◽  
Igor Píš ◽  
Masaaki Kobata ◽  
Aimo Winkelmann ◽  
Tomohiro Matsushita ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Zinc Oxide Films ◽  
Polycrystalline Zinc

Anomalous thermal desorption from polycrystalline zinc oxide films

1984 ◽  
Vol 121 (3) ◽  
pp. L85-L88 ◽  
Author(s):  
T.L. Tansley ◽  
C.P. Foley ◽  
D.F. Neely
Keyword(s):  
Zinc Oxide ◽  
Thermal Desorption ◽  
Oxide Films ◽  
Zinc Oxide Films ◽  
Polycrystalline Zinc

scholarly journals Microstructure and Optical Properties of E-Beam Evaporated Zinc Oxide Films—Effects of Decomposition and Surface Desorption

Materials ◽  
2020 ◽  
Vol 13 (16) ◽  
pp. 3510
Author(s):  
Lukasz Skowronski ◽  
Arkadiusz Ciesielski ◽  
Aleksandra Olszewska ◽  
Robert Szczesny ◽  
Mieczyslaw Naparty ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Optical Properties ◽  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Oxide Films ◽  
Growth Direction ◽  
Ultra High Vacuum ◽  
X Ray ◽  
Force Microscopy ◽  
Zinc Oxide Films

Zinc oxide films have been fabricated by the electron beam physical vapour deposition (PVD) technique. The effect of substrate temperature during fabrication and annealing temperature (carried out in ultra high vacuum conditions) has been investigated by means of atomic force microscopy, scanning electron microscopy, powder X-ray diffraction, X-ray photoelectron spectroscopy and spectroscopic ellipsometry. It was found that the layer deposited at room temperature is composed of Zn and ZnO crystallites with a number of orientations, whereas those grown at 100 and 200 ∘C consist of ZnO grains and exhibit privileged growth direction. Presented results clearly show the influence of ZnO decomposition and segregation of Zn atoms during evaporation and post-deposition annealing on microstructure and optical properties of zinc oxide films.

Thin polycrystalline zinc oxide films obtained by oxidation of metallic zinc films

2005 ◽  
Vol 473 (2) ◽  
pp. 241-246 ◽  
Author(s):  
Ya.I. Alivov ◽  
A.V. Chernykh ◽  
M.V. Chukichev ◽  
R.Y. Korotkov
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
Metallic Zinc ◽  
Zinc Oxide Films ◽  
Polycrystalline Zinc ◽  
Thin Polycrystalline

Electrostatic spray deposited polycrystalline zinc oxide films for ultraviolet luminescence device applications

2009 ◽  
Vol 481 (1-2) ◽  
pp. 735-739 ◽  
Author(s):  
Jin Li ◽  
Huiqing Fan ◽  
Xiaohua Jia ◽  
Jin Chen ◽  
Zhiyi Cao ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
Zinc Oxide Films ◽  
Polycrystalline Zinc ◽  
Device Applications ◽  
Electrostatic Spray

Role of the thickness on the electrical and optical performances of undoped polycrystalline zinc oxide films used as UV detectors

2006 ◽  
Vol 352 (9-20) ◽  
pp. 1448-1452 ◽  
Author(s):  
A. Pimentel ◽  
A. Gonçalves ◽  
A. Marques ◽  
R. Martins ◽  
E. Fortunato
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
Uv Detectors ◽  
Zinc Oxide Films ◽  
Polycrystalline Zinc

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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