Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source

2012 ◽  
Vol 83 (2) ◽  
pp. 02B704 ◽  
Author(s):  
Giovanni M. Malapit ◽  
Christian Lorenz S. Mahinay ◽  
Matthew D. Poral ◽  
Henry J. Ramos
2020 ◽  
Vol 91 (1) ◽  
pp. 013333
Author(s):  
Yoshikatsu Matsumoto ◽  
Masashi Kisaki ◽  
Katsuhiro Shinto ◽  
Haruhisa Nakano ◽  
Mamiko Sasao ◽  
...  

2008 ◽  
Vol 1066 ◽  
Author(s):  
Prakash R. Poudel ◽  
K. Hossain ◽  
J. Li ◽  
B. Gorman ◽  
A. Neogi ◽  
...  

ABSTRACTLow energy (55 KeV) Osmium ( Os− ) negative ion beam was used to implant (5×1016 atoms/cm2 ) into p-type-Si (100). The implantation was performed with the ion source of a National Electrostatic Corp. 3 MV Tandem accelerator. The implanted sample was subsequently annealed at 650 °C in a gas mixture that was 4% H2 + 96% Ar. Rutherford Backscattering spectrometry (RBS) analysis with 1.5 MeV Alpha particles was used to monitor the precipitate formation. Photoluminescence (PL) measurements were also performed to study possible applications of silicides in light emission. Cross-sectional Scanning Electron Microscopy (X-SEM) was performed for topographic image of the implanted region. RBS along with PL measurements indicate that the presence of osmium silicide (Os2Si3) phase for light emission in the implanted region of the sample.


1967 ◽  
Vol 38 (6) ◽  
pp. 745-748 ◽  
Author(s):  
William Aberth ◽  
James R. Peterson
Keyword(s):  

2021 ◽  
Vol 166 ◽  
pp. 112266
Author(s):  
Lizhen Liang ◽  
Chundong Hu ◽  
Wei Liu ◽  
Jianglong Wei ◽  
Yongjian Xu ◽  
...  

2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato

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