Fabrication of sharp tungsten-coated tip for atomic force microscopy by ion-beam sputter deposition

2011 ◽  
Vol 82 (11) ◽  
pp. 113707 ◽  
Author(s):  
Yukinori Kinoshita ◽  
Yoshitaka Naitoh ◽  
Yan Jun Li ◽  
Yasuhiro Sugawara
Keyword(s):  
Atomic Force Microscopy ◽  
Ion Beam ◽  
Sputter Deposition ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ion Beam Sputter Deposition

Direct Writing on Phosphate Glass Using Atomic Force Microscopy for Rapid Fabrication of Nanostructures

2016 ◽  
Author(s):  
Shama F. Barna ◽  
Kyle E. Jacobs ◽  
Glennys A. Mensing ◽  
Placid M. Ferreira
Keyword(s):  
Atomic Force Microscopy ◽  
Ion Beam ◽  
Soft Materials ◽  
Constant Current ◽  
Silver Nanostructures ◽  
Direct Writing ◽  
Ambient Conditions ◽  
Commercial Development ◽  
Force Microscopy ◽  
Atomic Force

Rapid and cost effective fabrication of nanostructures is critical for experimental exploration and translation of results for commercial development. While conventional techniques such as E-beam or Focused Ion beam lithography serve some prototyping needs for nano-scale experimentations, cost and rate considerations prohibit use for manufacturing. Specialized lithographic processes [e.g. nanosphere lithography or interference lithography] are also powerful tools in creating nanostructures but provide limited shapes, positioning and size control of nanostructures. In this work, we demonstrated a liquid-free and mask-less electrochemical writing approach using atomic force microscopy (AFM) that is capable of making arbitrary shapes of silver nanostructures in seconds on a solid state super-ionic (AgI)x (AgPO3)(1−x) glass. Under ambient conditions. silver is extracted selectively on super-ionic (AgI)x (AgPO3)(1−x) glass surface by negatively biasing an AFM probe relative to an Ag film counter electrode. Both voltage controlled and current controlled writings demonstrated localized extraction of silver. The current controlled approach is shown to be the preferred writing approach to make repeatable and uniform patterns of silver on (AgI)x AgPO3(1−x), where x represents the mole fraction of AgI in the mixture and the control parameter that tunes the conductivity of the sample. We demonstrated current controlled printing of silver on two different compositions of the material (i.e. (AgI)0.125 (AgPO3 )0.875 and (AgI)0.25(AgPO3)0.75 ). Depending on the magnitude of the constant current and tip speed, line-width of the silver pattern can be ∼150 nm. The length of these patterns are limited to the maximum distance the tip can be moved using the AFM position controls. The substrate being optically transparent allows the use of this writing technique for rapid prototyping plasmonic devices. By using the patterned substrate as a template for replica molding of soft materials such as polydimethylsiloxane (PDMS), this writing technique can also be utilized for high throughput nano-channel fabrication in biofluidics and microfluidics devices.

AFM Integrated with SEM and FIB: A Synergistic Union

2013 ◽  
Vol 21 (6) ◽  
pp. 26-31
Author(s):  
Aaron Lewis ◽  
A. Komissar ◽  
A. Ignatov ◽  
Oleg Fedoroyov ◽  
E. Maayan ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Research And Development ◽  
Scientific Community ◽  
Ion Beam ◽  
Basic Research ◽  
Force Microscopy ◽  
Atomic Force ◽  
Scanning Electron

Scanning electron microscopy (SEM) and ion beam milling techniques are mature nanoscale measurement technologies, whereas atomic force microscopy (AFM) is a developing technology generating intense interest in the scientific community for basic research and development. These techniques have generally existed in separate worlds. This article discusses a capability that marries these technologies through an instrument recently introduced by Nanonics, the 3TB4000.

High Contrast Imaging of Interphases in Ternary Polymer Blends Using Focused Ion Beam Preparation and Atomic Force Microscopy

2005 ◽  
Vol 38 (6) ◽  
pp. 2368-2375 ◽  
Author(s):  
Nick Virgilio ◽  
Basil D. Favis ◽  
Marie-France Pépin ◽  
Patrick Desjardins ◽  
Gilles L'Espérance
Keyword(s):  
Atomic Force Microscopy ◽  
Polymer Blends ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Contrast ◽  
Contrast Imaging ◽  
Force Microscopy ◽  
Atomic Force ◽  
High Contrast Imaging ◽  
Ternary Polymer

scholarly journals Fabrication of probe tips via the FIB method for nanodiagnostics of the surface of solids by atomic force microscopy

2021 ◽  
Vol 2086 (1) ◽  
pp. 012204
Author(s):  
D J Rodriguez ◽  
A V Kotosonova ◽  
H A Ballouk ◽  
N A Shandyba ◽  
O I Osotova ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Atomic Force Microscope ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Contact Mode ◽  
Ion Etching ◽  
Force Microscopy ◽  
Atomic Force

Abstract In this work, we carried out an investigation of commercial atomic force microscope (AFM) probes for contact and semi-contact modes, which were modified by focused ion beam (FIB). This method was used to modify the original tip shape of silicon AFM probes, by ion-etching and ion-enhance gas deposition. we show a better performance of the FIB-modified probes in contrast with the non-modified commercial probes. These results were obtained after using both probes in semi-contact mode in a calibration grating sample.

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