Growth of metal oxide thin films by laser‐induced metalorganic chemical vapor deposition

Koji Tokita; Fumio Okada

doi:10.1063/1.363718

Growth of metal oxide thin films by laser‐induced metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.363718 ◽

1996 ◽

Vol 80 (12) ◽

pp. 7073-7083 ◽

Cited By ~ 21

Author(s):

Koji Tokita ◽

Fumio Okada

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metal Oxide Thin Films ◽

Metalorganic Chemical

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Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2520 ◽

1996 ◽

Vol 35 (Part 1, No. 4B) ◽

pp. 2520-2525 ◽

Cited By ~ 44

Author(s):

Peter C. Van Buskirk ◽

Steve M. Bilodeau ◽

Jeffrey F. Roeder ◽

Peter S. Kirlin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Thin Films ◽

Liquid Source ◽

Complex Metal Oxide ◽

Metalorganic Chemical

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Plasma Metalorganic Chemical Vapor Deposition of Indium Oxide Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.28.l1096 ◽

1989 ◽

Vol 28 (Part 2, No. 7) ◽

pp. L1096-L1097 ◽

Cited By ~ 36

Author(s):

Toshiro Maruyama ◽

Toshio Kitamura

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Indium Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Characterization of Hafnium Oxide Thin Films by Source Gas Pulse Introduced Metalorganic Chemical Vapor Deposition Using Amino-Family Hf Precursors

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.6015 ◽

2003 ◽

Vol 42 (Part 1, No. 9B) ◽

pp. 6015-6018 ◽

Cited By ~ 12

Author(s):

Shiro Hino ◽

Makoto Nakayama ◽

Kenji Takahashi ◽

Hiroshi Funakubo ◽

Eisuke Tokumitsu

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Microstructure and optical properties of scandium oxide thin films prepared by metalorganic chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.1424072 ◽

2001 ◽

Vol 79 (23) ◽

pp. 3782-3784 ◽

Cited By ~ 32

Author(s):

Z. Xu ◽

A. Daga ◽

Haydn Chen

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Scandium Oxide ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.06.005 ◽

2013 ◽

Vol 230 ◽

pp. 28-32 ◽

Cited By ~ 8

Author(s):

Michael E.A. Warwick ◽

Russell Binions

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electric Field ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metal Oxide Thin Films ◽

Nanostructured Metal

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Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors

Chemistry of Materials ◽

10.1021/cm902123m ◽

2009 ◽

Vol 21 (22) ◽

pp. 5443-5455 ◽

Cited By ~ 32

Author(s):

Andrian P. Milanov ◽

Teodor Toader ◽

Harish Parala ◽

Davide Barreca ◽

Alberto Gasparotto ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Lanthanide Oxide ◽

Metalorganic Chemical

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Cobalt oxide thin films prepared by metalorganic chemical vapor deposition from cobalt acetylacetonate

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:2001381 ◽

2001 ◽

Vol 11 (PR3) ◽

pp. Pr3-637-Pr3-643 ◽

Cited By ~ 7

Author(s):

A. U. Mane ◽

K. Shalini ◽

S. A. Shivashankar

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Cobalt Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Cobalt Acetylacetonate ◽

Metalorganic Chemical

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Low temperature growth of oxide thin films by metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808238765 ◽

1998 ◽

Vol 20 (1-4) ◽

pp. 55-64 ◽

Cited By ~ 1

Author(s):

S. S. Yom

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Temperature Growth ◽

Low Temperature Growth ◽

Metalorganic Chemical

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Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting

International Journal of Hydrogen Energy ◽

10.1016/j.ijhydene.2014.11.131 ◽

2015 ◽

Vol 40 (5) ◽

pp. 2115-2131 ◽

Cited By ~ 23

Author(s):

S.N. Ariffin ◽

H.N. Lim ◽

Z.A. Talib ◽

A. Pandikumar ◽

N.M. Huang

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Metal Oxide ◽

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Photoelectrochemical Water Splitting ◽

Oxide Thin Films ◽

Metal Oxide Thin Films

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Photo-Assisted Metalorganic Chemical Vapor Deposition of Zinc Oxide Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.28.l346 ◽

1989 ◽

Vol 28 (Part 2, No. 3) ◽

pp. L346-L348 ◽

Cited By ~ 8

Author(s):

Toshiro Maruyama ◽

Akinobu Nakai

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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