Effects of hydrogen and rf power on the structural and electrical properties of rf sputtered hydrogenated amorphous silicon carbide films

W. K. Choi; F. L. Loo; F. C. Loh; K. L. Tan

doi:10.1063/1.362959

Effects of hydrogen and rf power on the structural and electrical properties of rf sputtered hydrogenated amorphous silicon carbide films

Journal of Applied Physics ◽

10.1063/1.362959 ◽

1996 ◽

Vol 80 (3) ◽

pp. 1611-1616 ◽

Cited By ~ 16

Author(s):

W. K. Choi ◽

F. L. Loo ◽

F. C. Loh ◽

K. L. Tan

Keyword(s):

Silicon Carbide ◽

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Rf Power ◽

Amorphous Silicon Carbide ◽

Structural And Electrical Properties ◽

Hydrogenated Amorphous

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Electrical properties before and after light-soaking of hydrogenated amorphous silicon carbide films prepared by the hydrogen radical CVD method

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/32/18/318 ◽

1999 ◽

Vol 32 (18) ◽

pp. 2448-2453

Author(s):

Akimori Tabata ◽

Hirotaka Kamijo ◽

Yasuo Suzuoki ◽

Teruyoshi Mizutani

Keyword(s):

Silicon Carbide ◽

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Carbide ◽

Cvd Method ◽

Before And After ◽

Hydrogen Radical ◽

Hydrogenated Amorphous

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Structure and electrical properties of hydrogenated amorphous silicon carbide prepared by plasma CVD method.

Journal of the Society of Materials Engineering for Resources of Japan ◽

10.5188/jsmerj.4.2_35 ◽

1991 ◽

Vol 4 (2) ◽

pp. 35-45

Author(s):

Akimori TABATA ◽

Kenji TOMIITA ◽

Yasuo SUZUOKI ◽

Teruyoshi MIZUTANI

Keyword(s):

Silicon Carbide ◽

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Plasma Cvd ◽

Amorphous Silicon Carbide ◽

Cvd Method ◽

Hydrogenated Amorphous

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Effect of Plasma Off Time on the Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Pulse-Modulated Plasma Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.6728 ◽

2001 ◽

Vol 40 (Part 1, No. 12) ◽

pp. 6728-6731 ◽

Cited By ~ 1

Author(s):

Akimori Tabata ◽

Makoto Sekito ◽

Teruyoshi Mizutani ◽

Yasuo Suzuoki

Keyword(s):

Silicon Carbide ◽

Electrical Properties ◽

Amorphous Silicon ◽

Plasma Deposition ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous ◽

Off Time

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Optical and Electrical Properties of Hydrogenated Amorphous Silicon Carbide

physica status solidi (b) ◽

10.1002/pssb.2221130128 ◽

1982 ◽

Vol 113 (1) ◽

pp. 277-284 ◽

Cited By ~ 27

Author(s):

R. Dutta ◽

P. K. Banerjee ◽

S. S. Mitra

Keyword(s):

Silicon Carbide ◽

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Optical And Electrical Properties ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Structural and electrical properties of metastable defects in hydrogenated amorphous silicon

Physical Review B ◽

10.1103/physrevb.91.245207 ◽

2015 ◽

Vol 91 (24) ◽

Cited By ~ 14

Author(s):

J. Melskens ◽

A. Schnegg ◽

A. Baldansuren ◽

K. Lips ◽

M. P. Plokker ◽

...

Keyword(s):

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Structural And Electrical Properties ◽

Hydrogenated Amorphous

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Characterization of hydrogenated amorphous silicon carbide films

10.1117/12.57018 ◽

1992 ◽

Author(s):

S. Uthanna

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Hydrogenated Amorphous Silicon Carbide Alternating-Current Thin-Film Light-Emitting Diodes

Journal of The Electrochemical Society ◽

10.1149/1.2742806 ◽

2007 ◽

Vol 154 (8) ◽

pp. H687

Author(s):

Rong-Hwei Yeh ◽

Ginn-Horng Chen ◽

Shih-Yung Lo ◽

Jyh-Wong Hong

Keyword(s):

Thin Film ◽

Silicon Carbide ◽

Amorphous Silicon ◽

Light Emitting Diodes ◽

Hydrogenated Amorphous Silicon ◽

Alternating Current ◽

Amorphous Silicon Carbide ◽

Light Emitting ◽

Hydrogenated Amorphous

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Growth of hydrogenated amorphous silicon carbide films from hydrocarbon gas of methane series mixed with silane and their properties

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(83)90643-9 ◽

1983 ◽

Vol 59-60 ◽

pp. 553-556 ◽

Cited By ~ 19

Author(s):

S. Nitta ◽

A. Hatano ◽

M. Yamada ◽

M. Watanabe ◽

M. Kawai

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Carbide ◽

Hydrocarbon Gas ◽

Hydrogenated Amorphous

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The effect of relatively low hydrogen dilution on the properties of carbon-rich hydrogenated amorphous silicon carbide films

Journal of Physics Conference Series ◽

10.1088/1742-6596/276/1/012173 ◽

2011 ◽

Vol 276 ◽

pp. 012173 ◽

Cited By ~ 4

Author(s):

Zhe Li ◽

Juncao Bian ◽

Haiyan He ◽

Xiwen Zhang ◽

Gaorong Han

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Carbide ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Optoelectronic and Structural Properties of Good Quality Hydrogenated Amorphous Silicon Carbide Films Deposited by Hot Wire Assisted RF Plasma Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.5480 ◽

1998 ◽

Vol 37 (Part 1, No. 10) ◽

pp. 5480-5484 ◽

Cited By ~ 4

Author(s):

S. Chattopadhyay ◽

Debabrata Das ◽

A. K. Barua ◽

D. L. Williamson ◽

S. T. Kshirsagar

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Structural Properties ◽

Plasma Deposition ◽

Hydrogenated Amorphous Silicon ◽

Rf Plasma ◽

Hot Wire ◽

Deposition Technique ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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